Silicon nanostructures fabricated by Au and SiH4 co-deposition technique using hot-wire chemical vapor deposition

Thin Solid Films

Volumn 520, Issue 1, 2011, Pages 74-78

  Chong, Su Kong ^a   Goh, Boon Tong ^a   Aspanut, Zarina ^a   Muhamad, Muhamad Rasat ^a   Varghese, Binni ^c   Sow, Chorng Haur ^c   Dee, Chang Fu ^b   Rahman, Saadah Abdul ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

^b INSTITUTE OF MICROENGINEERING AND NANOELECTRONICS IMEN   (Malaysia)

^c NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

Author keywords

High resolution transmission electron microscopy; Hot wire chemical vapor deposition; Nanostructures; Optical reflectance; Raman spectroscopy; Silicon; X ray diffraction

Indexed keywords

CO-DEPOSITION TECHNIQUE; CRYSTALLINE STRUCTURE; CRYSTALLINITIES; HIGH DENSITY; HIGH DEPOSITION RATES; HOT WIRE CHEMICAL VAPOR DEPOSITION; OPTICAL REFLECTANCE; SI NANOSTRUCTURES; SILICON NANOSTRUCTURES; VISIBLE REGION;

CHEMICAL VAPOR DEPOSITION; COALESCENCE; CRYSTALLITE SIZE; DEPOSITION; RAMAN SPECTROSCOPY; SILICON; SURFACE ROUGHNESS; TRANSMISSION ELECTRON MICROSCOPY; WIRE; X RAY DIFFRACTION;

NANOSTRUCTURES;

EID: 80054033195     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.06.042     Document Type: Article

References (24)

1. H. Matsumura Jpn. J. Appl. Phys. 37 1998 3175
2. J.K. Rath, A.J. Hardeman, C.H.M. van der Werf, P.A.T.T. van Veenendaal, M.Y.S. Rushe, and R.E.I. Schropp Thin Solid Films 430 2003 67
3. R.E.I. Schropp Thin Solid Films 517 2009 3415
4. K. Tonokura, and M. Koshi Curr. Opin. Solid State Mater. Sci. 6 2002 479
5. H.L. Duan, G.A. Zaharias, and S.F. Bent Thin Solid Films 395 2001 36
6. A. Gallagher Thin Solid Films 395 2001 25
7. Y. Ma, F. Liu, M. Zhu, J. Liu, H.-H. Wang, Y. Yang, and Y. Li Nanotechnology 20 2009 275201
8. S.K. Chong, B.T. Goh, Z. Aspanut, M.R. Muhamad, C.F. Dee, and S.A. Rahman Thin Solid Films 519 2011 4933
9. S.K. Chong, B.T. Goh, Z. Aspanut, M.R. Muhamad, C.F. Dee, and S.A. Rahman Mater. Lett. 65 2011 2452
10. N.M. Hwang, W.S. Cheong, D.Y. Yoon, and D.-Y. Kim J. Cryst. Growth 218 2000 33
11. L. Pereira, H. Aguas, P. Vilarinho, E. Fortunato, and R. Martins J. Mater. Sci. 40 2005 1387
12. K. Ashok, B. Subramanian, P. Kuppusami, and M. Jayachandran Cryst. Res. Technol. 44 2009 511
13. S.Y. Yoon, K.H. Kim, C.O. Kim, J.Y. Oh, and J. Jang J. Appl. Phys. 82 1997 5865
14. S.K. Chong, B.T. Goh, Z. Aspanut, M.R. Muhamad, C.F. Dee, and S.A. Rahman Appl. Surf. Sci. 257 2011 3320
15. N. Honda, A. Masuda, and H. Matsumura J. Non-Cryst. Solids 266-269 2000 100
16. S.R. Jadkar, J.V. Sali, A.M. Funde, Nabeel Ali Bakr, P.B. Vidyasagar, R.R. Hawaldar, and D.P. Amalnerkar Sol. Energy Mater. Sol. Cells 91 2007 714
17. D.-S. Wuu, S.-Y. Lien, H.-Y. Mao, B.-R. Wu, I.-C. Hsieh, P.-C. Yao, J.-H. Wang, and W.-C. Chen Thin Solid Films 498 2006 9
18. D.B. Cullity Elements of X-Ray Diffraction 1956 Addison-Wesley Inc. Massachusetts
19. T.N. Nguyen, V.D. Nguyen, S. Jung, and J. Yi Appl. Surf. Sci. 255 2009 8252
20. E.S. Kolesar Jr., V.M. Bright, and D.M. Sowders Thin Solid Films 290-291 1996 23
21. Y. Wang, N. Lu, H. Xu, G. Shi, M. Xu, X. LH. Li, W. Wang, D. Qi, Y. Lu, and L. Chi Nano Res. 3 2010 520
22. A. Nakajima, T. Suzuki, M. Yoshimi, and K. Yamamoto Sol. Energy Mater. Sol. Cells 48 1997 287
23. L. Hu, and G. Chen Nano Lett. 7 2007 3249
24. W.Q. Hong J. Phys. D: Appl. Phys. 22 1989 1384