Effect of substrate temperature on gold-catalyzed silicon nanostructures growth by hot-wire chemical vapor deposition (HWCVD)

Applied Surface Science

Volumn 257, Issue 8, 2011, Pages 3320-3324

  Chong, Su Kong ^a   Goh, Boon Tong ^a   Aspanut, Zarina ^a   Muhamad, Muhamad Rasat ^a   Dee, Chang Fu ^b   Rahman, Saadah Abdul ^a  

^a UNIVERSITY OF MALAYA   (Malaysia)

^b INSTITUTE OF MICROENGINEERING AND NANOELECTRONICS IMEN   (Malaysia)

Author keywords

Crystallinity; HRTEM; HWCVD; Microstructure parameter; Silicon nanostructures

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTALLITE SIZE; GOLD COATINGS; GOLD DEPOSITS; NANOSTRUCTURES; SILICON; SUBSTRATES;

CRYSTALLINITIES; HRTEM; HWCVD; MICRO-STRUCTURE PARAMETERS; SILICON NANO STRUCTURES;

AMORPHOUS SILICON;

EID: 78651357416     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2010.11.012     Document Type: Article

References (33)

1. X. Duan, C. Niu, V. Sahi, J. Chen, J. Parce, S. Empedocles, and J.L. Goldman Nature 425 2003 274
2. P. Janda, J. Valenta, T. Ostatnicky, E. Skopalova, I. Pelant, R.G. Elliman, and R. Tomasiunas J. Lumin. 121 2006 267
3. R. Yan, D. Gargas, and P. Yang Nat. Photonics 3 2009 569
4. X. Duan, Y. Huang, Y. Cui, J. Wang, and C.M. Lieber Nature 409 2001 66
5. X.W. Zhao, and F.Y. Yang J. Vaccine Sci. Technol. B 26 2 2008 675
6. S. Sharma, T.I. Kamins, and R.S. Williams J. Cryst. Growth 267 2004 613
7. Th. Stelzner, G. Andra, F. Falk, E. Wendler, W. Wesch, R. Scholz, and S. Christiansen Nucl. Instrum. Methods Phys. Res. B 257 2007 172
8. J. Niu, J. Sha, and D. Yang Physica E 23 2004 131
9. K.A. Jeon, J.H. Kim, and S.Y. Lee Prog. Solid State Chem. 33 2005 107
10. N. Fukata, T. Oshima, N. Okada, T. Kizuka, T. Tsurui, S. Ito, and K. Murakami Physica B 376-377 2006 864
11. C.C. Buttner, N.D. Zakharov, E. Pippel, U. Gosele, and P. Werner Semicond. Sci. Technol. 23 2008 075040
12. T.F.G. Muller, D. Knoesen, C. Arendse, R. Swanepoel, S. Halindintwali, and C. Theron Thin Solid Films 501 2006 98
13. H.L. Duan, G.A. Zaharias, and S.F. Bent Thin Solid Films 395 2001 36
14. K. Tonokura, K. Inoue, and M. Koshi J. Non-Cryst. Solids 299-302 2002 25
15. A. Gallagher Thin Solid Films 395 2001 25
16. L. Pereira, H. Aguas, P. Vilarinho, E. Fortunato, and R. Martins J. Mater. Sci. 40 2005 1387
17. K. Ashok, B. Subramanian, P. Kuppusami, and M. Jayachandran Cryst. Res. Technol. 44 5 2009 511
18. Z. Tan, S.M. Heald, M. Rapposch, C.E. Bouldin, and J.C. Woicik Phys. Rev. B 46 1992 9505
19. F. Hodzhaoglu, F. Kurniawan, V. Mirsky, and C. Nanev Cryst. Res. Technol. 43 6 2008 588
20. S.Y. Yoon, K.H. Kim, C.O. Kim, J.Y. Oh, and J. Jang J. Appl. Phys. 82 1997 5865
21. S.R. Herd, P. Chaudhari, and M.H. Brodsky J. Non-Cryst. Solids 7 1972 309
22. W. Kern, and D. Poutinen RCA Rev. 31 1970 187
23. Y. Ma, F.Z. Liu, M.F. Zhu, and P.G. Yin Thin Solid Films 517 2009 3492
24. H. Matsumura Jpn. J. Appl. Phys. 30 1991 L1522
25. E.F. Kaelble Handbook of X-Rays 1967 McGraw-Hill New York pp. 15-17
26. S.R. Jadkar, J.V. Sali, A.M. Funde, N.A. Bakr, P.B. Vidyasagar, R.R. Hawaldar, and D.P. Amalnerkar Sol. Energy Mater. Sol. Cells 91 2007 714
27. J.-H. Shim, N.-H. Cho, E.-H. Lee, and H.S. Lee J. Mater. Res. 23 3 2008 790
28. S. Mukhopadhyay, C. Das, and S. Ray J. Phys. D: Appl. Phys. 37 2004 1736
29. L. Pereira, H. Aguas, R.M. Martins, E. Fortunato, and R. Martins J. Non-Cryst. Solids 338-340 2004 178
30. A.A. Longford, M.L. Fleet, B.P. Nelson, W.A. Lanford, and N. Maley Phys. Rev. B 45 1992 13367
31. B.T. Goh, S.M. Gani, and S.A. Rahman Adv. Mater. Res. 31 2008 80
32. A.H. Mahan, J. Carapella, B.P. Nelson, R.S. Crandall, and I. Balberg J. Appl. Phys. 69 1991 6728
33. A. Chowdhury, S. Mukhopadhyay, and S. Ray J. Cryst. Growth 304 2007 352