Transport mechanism of deposition precursors in catalytic chemical vapor deposition studied using a reactor tube

Journal of Non-Crystalline Solids

Volumn 266-269 A, Issue , 2000, Pages 100-104

  Honda, Namiko ^a   Masuda, Atsushi ^a   Matsumura, Hideki ^a  

^a JAPAN ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0002639790     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0022-3093(99)00747-4     Document Type: Article

References (4)

1. H. Matsumura, H. Tachibana, Appl. Phys. Lett. 47 (1985) 833.
2. A.H. Mahan, J. Carapella, B.P. Nelson, R.S. Crandall, I. Balberg, J. Appl. Phys. 69 (1991) 6728.
3. H. Matsumura, Jpn. J. Appl. Phys. 37 (1998) 3175.
4. A. Matsuda, K. Nomoto, Y. Takeuchi, A. Suzuki, A. Yuuki, J. Perrin, Surf. Sci. 227 (1990) 50.