Biomimetic corrugated silicon nanocone arrays for self-cleaning antireflection coatings

Nano Research

Volumn 3, Issue 7, 2010, Pages 520-527

  Wang, Yandong ^a   Lu, Nan ^a   Xu, Hongbo ^a   Shi, Gang ^a   Xu, Miaojun ^a   Lin, Xiaowen ^b   Li, Haibo ^a   Wang, Wentao ^a   Qi, Dianpeng ^a   Lu, Yanqing ^b   Chi, Lifeng ^a,c  

^a Jilin University   (China)

^b NANJING UNIVERSITY   (China)

^c UNIVERSITY OF MÜNSTER   (Germany)

Author keywords

Antireflection; Nanosphere lithography; Reactive ion etching; Silicon nancone (SiNC) arrays; Superhydrophobic

Indexed keywords

EID: 77954458919     PISSN: 19980124     EISSN: 19980000     Source Type: Journal    
DOI: 10.1007/s12274-010-0012-x     Document Type: Article

References (31)

1. Striemer, C. C.; Fauchet, P. M. Dynamic etching of silicon for broadband antireflection applications. Appl. Phys. Lett. 2002, 81, 2980-2982.
2. Lee, Y. J.; Ruby, D. S.; Peters, D. W.; McKenzie, B. B.; Hsu, J. W. P. ZnO nanostructures as efficient antireflection layers in solar cells. Nano Lett. 2008, 8, 1501-1505.
3. Gombert, A.; Glaubitt, W.; Rose, K.; Dreibholz, J.; Blasi, B.; Heinzel, A.; Sporn, D.; Doll, W.; Wittwer, V. Antireflective transparent covers for solar devices. Sol. Energy2000, 68, 357-360.
4. Lee, C.; Bae, S. Y.; Mobasser, S.; Manohara, H. A novel silicon nanotips antireflection surface for the micro sun sensor. Nano Lett. 2005, 5, 2438-2442.
5. Min, W. L.; Jiang, B.; Jiang, P. Bioinspired self-cleaning antireflection coatings. Adv. Mater. 2008, 20, 3914-3918.
6. Zhu, J.; Yu, Z. F.; Burkhard, G. F.; Hsu, C. M.; Connor, S. T.; Xu, Y. Q.; Wang, Q.; McGehee, M.; Fan, S. H.; Cui, Y. Optical absorption enhancement in amorphous silicon nanowire and nanocone arrays. Nano Lett. 2009, 9, 279-282.
7. Boden, S. A.; Bagnall, D. M. Tunable reflection minima of nanostructured antireflective surfaces. Appl. Phys. Lett. 2008, 93, 133108.
8. Huang, Y. F.; Chattopadhyay, S.; Jen, Y. J.; Peng, C. Y.; Liu, T. A.; Hsu, Y. K.; Pan, C. L.; Lo, H. C.; Hsu, C. H.; Chang, Y. H.; Lee, C. S.; Chen, K. H.; Chen, L. C. Improved broadband and quasi-omnidirectional anti-reflection properties with biomimetic silicon nanostructures. Nat. Nanotechnol. 2007, 2, 770-774.
9. Heine, C.; Morf, R. H. Submicrometer gratings for solar energy applications. Appl. Opt. 1995, 34, 2476-2482.
10. Kanamori, Y.; Roy, E.; Chen, Y. Antireflection sub-wavelength gratings fabricated by spin-coating replication. Microelectron. Eng. 2005, 78-79, 287-293.
11. 2 using motheye antireflection surface relief structures. Appl. Phys. Lett. 2002, 80, 2242-2244.
12. Zhang, G. M.; Zhang, J.; Xie, G. Y.; Liu, Z. F.; Shao, H. B. Cicada wings: A stamp from nature for nanoimprint lithography. Small2006, 2, 1440-1443.
13. Sun, C. H.; Jiang, P.; Jiang, B. Broadband moth-eye antireflection coatings on silicon. Appl. Phys. Lett. 2008, 92, 061112.
14. Chen, H. L.; Chuang, S. Y.; Lin, C. H.; Lin, Y. H. Using colloidal lithography to fabricate and optimize subwavelength pyramidal and honeycomb structures in solar cells. Opt. Express2007, 15, 14793-14803.
15. Lohmuller, T.; Helgert, M.; Sundermann, M.; Brunner, R.; Spatz, J. P. Biomimetic interfaces for high-performance optics in the deep-UV light range. Nano Lett. 2008, 8, 1429-1443.
16. Wang, S.; Yu, X. Z.; Fan, H. T. Simple lithographic approach for subwavelength structure antireflection. Appl. Phys. Lett. 2007, 91, 061105.
17. Lee, Y.; Koh, K.; Na, H.; Kim, K.; Kang, J. J.; Kim, J. Lithography-free fabrication of large area subwavelength antireflecion structure using thermally dewetted Pt/Pd alloy etch mask. Nanoscale Res. Lett. 2009, 4, 364-370.
18. Kanamori, Y.; Hane, K.; Sai, H.; Yugami, H. 100 nm period silicon antireflection structures fabricated using a porous alumina membrane mask. Appl. Phys. Lett. 2001, 78, 142.
19. Ting, C. J.; Huang, M. C.; Tsai, H. Y.; Chou, C. P.; Fu, C. C. Low cost fabrication of the large-area anti-reflection films from polymer by nanoimprint/hot-embossing technology. Nanotechnology2008, 19, 205301-205305.
20. Rybczynski, J.; Hilgendorff, M.; Giersig, M. Nanosphere lithography-Fabrication of various periodic magnetic particle arrays using versatile nanosphere masks. In Low-Dimensional Systems: Theory, Reparation, and Some Applications (NATO Science Series II: Mathematics, Physics and Chemistry, Vol. 91). Liz-Marzán, L. M.; Giersig, M., Eds.; Springer: Berlin, 2003; pp 163-172.
21. Xu, H. B.; Lu, N.; Qi, D. P.; Hao, J. Y.; Gao, L. G.; Zhang, B.; Chi, L. F. Biomimetic antireflective Si nanopillar arrays. Small2008, 4, 1972-1975.
22. Lalanne, P.; Morris, G. M. Antireflection behavior of silicon subwavelength periodic structures for visible light. Nanotechnology1997, 8, 53-56.
23. Kanamori, Y.; Sasaki, M.; Hane, K. Broadband antireflection gratings fabricated upon silicon substrates. Opt. Lett. 1999, 24, 1422-1424.
24. Chen, Q.; Hubbard, G.; Shields, P. A.; Liu, C.; Allsopp, D. W. E.; Wang, W. N.; Abott, S. Broadband moth-eye antireflection coatings fabricated by low-cost nanoimprinting. Appl. Phys. Lett. 2009, 94, 263118.
25. Chiu, C. H.; Yu, P. C.; Kuo, H. C.; Chen, C. C.; Lu, T. C.; Wang, S. C.; Hsu, S. H.; Cheng, Y. J.; Chang, Y. C. Broadband and omnidirectional antireflection employing disordered GaN nanopillars. Opt. Express2008, 16, 8748-8754.
26. Yu, Z. N.; Gao, H.; Wu, W.; Ge, H. X.; Chou, S. Y. Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithographyand liftoff. J. Vac. Sci. Technol. B2003, 21, 2874-2877.
27. Hadobas, K.; Kirsch, S.; Carl, A.; Acet, M.; Wassermann, E. F. Reflection properties of nanostructure-arrayed silicon surfaces. Nanotechnology2000, 11, 161-164.
28. Li, X.; Gao, J. P.; Xue, L. J.; Han, Y. C. Porous polymer films with gradient-refractive-index structure for broadband and omnidirectional antireflection coatings. Adv. Funct. Mater. 2010, 20, 259-265.
29. Moharam, M. G.; Pommet, D. A.; Gram, E. B.; Gaylord, T. K. Formulation for stable and efficient implementation of the rigorous coupled-wave analysis of binary gratings. J. Opt. Soc. Am. A1995, 12, 1068-1076.
30. Cao, M. W.; Song, X. Y.; Zhai, J.; Wang, J. B.; Wang, Y. L. Fabrication of highly antireflective silicon surfaces with superhydrophobicity. J. Phys. Chem. B2006, 110, 13072-13075.
31. Li, Y. F.; Zhang, J. H.; Zhu, S. J.; Dong, H. P.; Wang, Z. H.; Sun, Z. Q.; Guo, J. R.; Yang, B. Bioinspired silicon hollow-tip arrays for high performance broadband. J. Mater. Chem. 2009, 19, 1806-1810.