Optical reflectance reduction of textured silicon surfaces coated with an antireflective thin film

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 23-29

  Kolesar Jr , Edward S ^a   Bright, Victor M ^b   Sowders, David M ^b  

^a TEXAS CHRISTIAN UNIVERSITY   (United States)

^b AIR FORCE INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Chemical etching; Optical reflectance; Porous silicon; Silicon micromachining

Indexed keywords

ETCHING; LIGHT ABSORPTION; MICROMACHINING; OPTICAL COATINGS; POROUS SILICON; REFLECTOMETERS; SILICON WAFERS; SPECTRUM ANALYSIS; SURFACE PROPERTIES; THIN FILMS;

ELECTROCHEMICAL ETCHING; TEXTURED SILICON SURFACES;

ANTIREFLECTION COATINGS;

EID: 0030386042     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09064-5     Document Type: Article

References (15)

1. S. Khemthong, S. Cababiss, J. Zhao and A. Wang, Low cost silicon solar cells with high efficiency at high concentrations, Proc. 22nd IEEE PVSC, 1 (1991) 268-271.
2. J.A. Zhao, A. Wang and M.A. Green, 24% efficient PERL structure silicon solar cells, Proc. 21st IEEE PVSC, 2 (1990) 333-335.
3. C. Linder, L. Parette, M.A. Gretillat, V.P. Jaecklin and N.F. de Rooij, Review: surface micromachining, J. Micromech. Microeng., 2 (1992) 122-132.
4. P.C. Searson, J.M. Macaulay and S.M. Prokes, The formation, morphology, and optical properties of porous silicon structures, J. Electrochem. Soc., 139 (1992) 3373-3378.
5. S.G. Uyehata and E.S. Kolesar, Micromachined silicon surfaces for maximizing optical absorption at 632.8 nm, J. Micromech. Microeng., 1 (1991) 171-181.
6. C.R. Baroana and H.W. Brandhorst, V-grooved silicon solar cells, Proc. 11th IEEE PVSC, (1975) 44-48.
7. M. Mehregany and S.D. Senturia, Anisotropic etching of silicon in hydrazine, Sensors and Actuators, 13 (1988) 375-390.
8. K.B. Sundaram and H.W. Chang, Electrochemical etching of silicon by hydrazine, J. Electrochem. Soc., 140 (1993) 1592-1597.
9. A. Uhlir, Jr., Electrolytic shaping of germanium and silicon, Bell Syst. Tech. J., 35 (1956) 333-347.
10. L.T. Canham, Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers, Appl. Phys. Lett. B, 57 (1990) 1046-1048.
11. K.H. Jung, S. Shin, D.L. Kwong, T. George, T.L. Lin, H.Y. Liu and J. Zavada, Photoluminescence, structure, and composition of laterally anodized porous Si, J. Electrochem. Soc., 139 (1992) 3363-3372.
12. J.P. Zheng, K.L. Jiao, W.P. Shen, W.A. Anderson and H.S. Kwok, Highly sensitive photodetector using porous silicon, Appl. Phys. Lett. B, 61 (1992) 459-461.
13. K. Park, The extreme values of reflectivity and the conditions for zero reflection from thin dielectric films on metal, Appl. Opt., 3 (1964) 877-881.
14. G. Mass, H.H. Schroeder and A.F. Turner, Mirror coatings for low visible and high infrared reflectance, J. Opt. Soc. Am., 28 (1956) 31-35.
15. D. Palik (ed.), Handbook of Optical Constants of Solids, Academic Press, Orlando, FL, 1985.