Growth of BiFeO3/SrTiO3 artificial superlattice structure by RF sputtering

Journal of Crystal Growth

Volumn 334, Issue 1, 2011, Pages 90-95

  Chiu, Shang Jui ^a,b   Liu, Yen Ting ^c   Lee, Hsin Yi ^b   Yu, Ge Ping ^a   Huang, Jia Hong ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^c NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

A1. X ray diffraction; A3. RF sputtering; A3. Thin film epitaxial growth; B2. Ferroelectric materials

Indexed keywords

A3. RF SPUTTERING; ARTIFICIAL SUPERLATTICES; BRAGG LINES; BRAGG PEAKS; CRYSTALLINE FILMS; CRYSTALLINE QUALITY; FERROELECTRIC PROPERTY; HIGH QUALITY; INTERFACE QUALITY; INTERFACE ROUGHNESS; LATTICE STRAIN; MULTIFERROICS; PARAELECTRICS; RF-MAGNETRON SPUTTERING; RF-SPUTTERING; SRTIO; SUB-LAYERS; SUBSTRATE TEMPERATURE; SUPER-LATTICE FILMS; SUPER-LATTICE STRUCTURES; X RAY REFLECTIVITY;

CRYSTALLINE MATERIALS; FERROELECTRIC MATERIALS; FERROELECTRICITY; FILMS; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; STRONTIUM ALLOYS; STRONTIUM TITANATES; SUBSTRATES; X RAY DIFFRACTION;

SUPERLATTICES;

EID: 80053300415     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2011.08.019     Document Type: Article

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