Preparation of heteroepitaxial LaNiO3 thin films on a SrTiO 3 substrate for growing an artificial superlattice with RF sputtering

Materials Chemistry and Physics

Volumn 92, Issue 2-3, 2005, Pages 585-590

  Lee, Hsin Yi ^a   Hsu, C H ^a   Hsieh, Y W ^a   Chen, Yen Hua ^b   Liang, Yuan Chang ^b   Wu, Tai Bor ^b   Chou, L J ^b  

^a NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

Artificial superlattices; Dielectric constant; Grazing incidence X ray diffraction; RF magnetron sputtering; X ray scattering

Indexed keywords

HIGH RESOLUTION ELECTRON MICROSCOPY; MAGNETRON SPUTTERING; MOLECULAR BEAM EPITAXY; PERMITTIVITY; STOICHIOMETRY; STRONTIUM COMPOUNDS; SUBSTRATES; SUPERLATTICES; THIN FILMS; X RAY DIFFRACTION ANALYSIS; X RAY SCATTERING;

ARTIFICIAL SUPERLATTICES; FERROELECTRIC FILMS; GRAZING-INCIDENCE X-RAY DIFFRACTION; IMAGING SENSORS;

LANTHANUM COMPOUNDS;

EID: 17444377588     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2005.02.008     Document Type: Article

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