Structural characterization of sputter-deposited LaNiO3 thin films on Si substrate by x-ray reflectivity and diffraction

Journal of Materials Research

Volumn 12, Issue 11, 1997, Pages 3165-3173

  Lee, Hsin Yi ^a,b   Wu, Taj Bor ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTROMAGNETIC WAVE REFLECTION; ELECTRON DIFFRACTION; LANTHANUM COMPOUNDS; MAGNETRON SPUTTERING; SILICON; SPUTTER DEPOSITION; SURFACE STRUCTURE; SURFACE TREATMENT; TEXTURES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

LANTHANUM NIOBATE; X RAY REFLECTIVITY;

FERROELECTRIC MATERIALS;

EID: 0031273739     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/JMR.1997.0413     Document Type: Article

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