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Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 42, Issue 2 A, 2003, Pages 544-548

Dielectric properties of nanocrystalline barium titanate thin films deposited by RF magnetron sputtering

(4) Hsi, Chi Shiung a Hsiao, Fu Yuan b Wu, Nan Chung b Wang, Moo Chin c

a I SHOU UNIVERSITY (Taiwan)

b NATIONAL CHENG KUNG UNIVERSITY (Taiwan)

c NATIONAL KAOHSIUNG UNIVERSITY OF APPLIED SCIENCES (Taiwan)

Author keywords

Dielectric properties; Leakage current density; Nanocrystalline BaTiO3 thin films; RF magnetron sputtering

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; CURRENT DENSITY; FILM PREPARATION; LEAKAGE CURRENTS; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; PERMITTIVITY; SINTERING; THICKNESS MEASUREMENT; THIN FILMS;

GRANULAR CRYSTALLITES; NANOCRYSTALLINE BARIUM TITANATE;

BARIUM TITANATE;

EID: 0038005543 PISSN: 00214922 EISSN: None Source Type: Journal
DOI: 10.1143/jjap.42.544 Document Type: Article

Times cited : (18)

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