Hydrogenated nanocrystalline silicon thin films prepared by hot-wire method with varied process pressure

Journal of Nanotechnology

Volumn , Issue , 2011, Pages

  Jadkar, S R ^a   Waman, V S ^a   Funde, A M ^a   Kamble, M M ^a   Pramod, M R ^a   Hawaldar, R R ^b   Amalnerkar, D P ^b   Sathe, V G ^c   Gosavi, S W ^a  

^a UNIVERSITY OF PUNE   (India)

^b CENTRE FOR MATERIALS FOR ELECTRONICS TECHNOLOGY C MET   (India)

^c UGC DAE CONSORTIUM FOR SCIENTIFIC RESEARCH   (India)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 80052659594     PISSN: 16879503     EISSN: 16879511     Source Type: Journal    
DOI: 10.1155/2011/242398     Document Type: Article

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