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Volumn 354, Issue 19-25, 2008, Pages 2087-2091
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Controlling the quality of nanocrystalline silicon made by hot-wire chemical vapor deposition by using a reverse H2 profiling technique
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Author keywords
Chemical vapor deposition; Microcrystallinity; Nanocrystals; Photovoltaics; Silicon; Solar cells
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Indexed keywords
CATALYST ACTIVITY;
ENERGY CONVERSION;
NANOCRYSTALS;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
SOLAR CELLS;
THIN FILMS;
CRYSTALLINE RATIO;
PROFILING TECHNIQUE;
NANOCRYSTALLINE SILICON;
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EID: 42649114128
PISSN: 00223093
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jnoncrysol.2007.10.046 Document Type: Article |
Times cited : (29)
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References (17)
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