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Volumn 76, Issue 3, 2011, Pages 519-531
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Determination of the optical parameters of a-Si:H thin films deposited by hot wire-chemical vapour deposition technique using transmission spectrum only
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Author keywords
Dielectric constant; Hydrogenated amorphous silicon (a Si:H); Optical properties; Refractive index; UV visible spectroscopy
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Indexed keywords
AMORPHOUS FILMS;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
ENERGY GAP;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HYDROGENATION;
OPTICAL BAND GAPS;
OPTICAL CONDUCTIVITY;
OPTICAL PROPERTIES;
OPTICAL VARIABLES CONTROL;
OSCILLATORS (MECHANICAL);
PERMITTIVITY;
PLASMA DIAGNOSTICS;
REFRACTIVE INDEX;
SILICON;
SPECTRUM ANALYSIS;
ULTRAVIOLET VISIBLE SPECTROSCOPY;
VAPOR DEPOSITION;
CHEMICAL VAPOUR DEPOSITION;
FOURIER TRANSFORM INFRARED;
HYDROGENATED AMORPHOUS SILICON (A-SI:H);
HYDROGENATED AMORPHOUS SILICON (A-SI:H) FILMS;
INTERFERENCE FRINGE;
OPTICAL PARAMETER;
TRANSMISSION SPECTRUMS;
UV VISIBLE SPECTROSCOPY;
AMORPHOUS SILICON;
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EID: 79952976474
PISSN: 03044289
EISSN: None
Source Type: Journal
DOI: 10.1007/s12043-011-0024-4 Document Type: Article |
Times cited : (147)
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References (28)
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