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Volumn 76, Issue 3, 2011, Pages 519-531

Determination of the optical parameters of a-Si:H thin films deposited by hot wire-chemical vapour deposition technique using transmission spectrum only

Author keywords

Dielectric constant; Hydrogenated amorphous silicon (a Si:H); Optical properties; Refractive index; UV visible spectroscopy

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; ENERGY GAP; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; OPTICAL BAND GAPS; OPTICAL CONDUCTIVITY; OPTICAL PROPERTIES; OPTICAL VARIABLES CONTROL; OSCILLATORS (MECHANICAL); PERMITTIVITY; PLASMA DIAGNOSTICS; REFRACTIVE INDEX; SILICON; SPECTRUM ANALYSIS; ULTRAVIOLET VISIBLE SPECTROSCOPY; VAPOR DEPOSITION;

EID: 79952976474     PISSN: 03044289     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12043-011-0024-4     Document Type: Article
Times cited : (147)

References (28)
  • 2
    • 79952905408 scopus 로고    scopus 로고
    • Ph.D. Thesis ( Utrecht University
    • K F Feenstra, Ph.D. Thesis (Utrecht University, 1998)
    • (1998)
    • Feenstra, K.F.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.