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Volumn 21, Issue 37, 2011, Pages 14185-14192
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Fabrication of three-dimensional imprint lithography templates by colloidal dispersions
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Author keywords
[No Author keywords available]
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Indexed keywords
3D MASKS;
AIR BUBBLES;
CAPILLARY STRESS;
CHEMICAL COMPATIBILITY;
COLLOIDAL DISPERSION;
FLEXIBLE SUBSTRATE;
GEOMETRY INFORMATION;
HARD SPHERES;
IMPRINT LITHOGRAPHY;
LOW COSTS;
LOW GAS PERMEABILITY;
ONE-FACTOR;
POROUS PACKINGS;
SELF-ALIGNED;
SOFT MOLD;
STAMP MATERIALS;
SUBMICRON-SIZED;
THIN FILM STACKS;
WATER EVAPORATION;
AIR PERMEABILITY;
DISPERSIONS;
ELASTOMERS;
FLUORINE CONTAINING POLYMERS;
GAS PERMEABILITY;
SUBSTRATES;
THREE DIMENSIONAL;
USER INTERFACES;
NANOIMPRINT LITHOGRAPHY;
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EID: 80052527625
PISSN: 09599428
EISSN: 13645501
Source Type: Journal
DOI: 10.1039/c1jm10848d Document Type: Article |
Times cited : (13)
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References (30)
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