Residual stress gradient analysis with GIXRD on ZrO2 thin films deposited by MOCVD

Surface and Coatings Technology

Volumn 206, Issue 2-3, 2011, Pages 405-410

  Chen, Zhe ^a   Prud'homme, Nathalie ^a   Wang, Bin ^a   Ji, Vincent ^a  

^a UNIVERSITÉ PARIS SUD   (France)

Author keywords

Films; Residual stress; Stress gradient; X ray methods; ZrO2

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; CRYSTALLINE STRUCTURE; FILM COOLING; GROWTH STRESS; METAL-ORGANIC; NEAR SURFACE REGIONS; RESIDUAL STRESS GRADIENTS; RESIDUAL STRESS PROFILES; ROOM TEMPERATURE; STRESS GRADIENT; TENSILE RESIDUAL STRESS; TETRAGONAL PHASE; X RAY BEAM; X-RAY METHODS; ZRO2; ZRO2 THIN FILMS;

CHEMICAL ANALYSIS; CHEMICAL VAPOR DEPOSITION; DEPOSITION; DIFFRACTION; DIFFRACTIVE OPTICS; FILM GROWTH; ORGANIC CHEMICALS; SINGLE CRYSTALS; STRESS ANALYSIS; X RAY DIFFRACTION; ZIRCONIA; ZIRCONIUM; ZIRCONIUM ALLOYS;

RESIDUAL STRESSES;

EID: 80052355847     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.07.036     Document Type: Article

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