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Volumn 519, Issue 22, 2011, Pages 7702-7706
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Conductive-atomic force microscopy study of local electron transport in nanostructured titanium nitride thin films
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Author keywords
Conductive atomic force microscopy; Conductivity; Sputtering; Thin films; Titanium nitride
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Indexed keywords
CONDUCTIVE-ATOMIC FORCE;
CURRENT FLOWS;
ELECTRICALLY CONDUCTIVE;
ELECTRON TRANSPORT;
FOUR-PROBE TECHNIQUES;
GRAIN BOUNDARY RESISTANCE;
GRAIN INTERIORS;
LOCAL VARIATIONS;
NANOSTRUCTURED TITANIUM;
NITRIDE THIN FILMS;
PERCOLATION PATH;
POTENTIAL BARRIERS;
TOPOGRAPHY MEASUREMENT;
TOTAL RESISTANCE;
ATOMIC FORCE MICROSCOPY;
CONDUCTIVE FILMS;
CURRENT VOLTAGE CHARACTERISTICS;
ELECTRON TRANSITIONS;
ELECTRON TRANSPORT PROPERTIES;
GRAIN BOUNDARIES;
GRAIN SIZE AND SHAPE;
SOLVENTS;
SURFACE TOPOGRAPHY;
THIN FILMS;
TITANIUM;
TOPOGRAPHY;
TITANIUM NITRIDE;
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EID: 80052132146
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/j.tsf.2011.05.052 Document Type: Article |
Times cited : (14)
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References (31)
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