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Volumn 257, Issue 7, 2011, Pages 3069-3074

Substrate-temperature dependent structure and composition variations in RF magnetron sputtered titanium nitride thin films

(3) Vasu, K a Krishna, M Ghanashyam a Padmanabhan, K A a

a UNIVERSITY OF HYDERABAD (India)

Author keywords

Magnetron sputtering; Optical properties; Stoichiometry; Thin films; Titanium nitride

Indexed keywords

CRYSTAL STRUCTURE; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; STOICHIOMETRY; TITANIUM NITRIDE;

AS-DEPOSITED THIN FILMS; COMPOSITION VARIATION; INCREASING TEMPERATURES; NITROGEN ATMOSPHERES; RF REACTIVE MAGNETRON SPUTTERING; SUBSTRATE TEMPERATURE; TEMPERATURE RANGE; TITANIUM NITRIDE THIN FILMS;

THIN FILMS;

EID: 79251600672 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.10.118 Document Type: Article

Times cited : (54)

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