Growth, surface morphology, optical properties and electrical resistivity of ε-TiN x (0.4 < x ≤ 0.5) films

Applied Surface Science

Volumn 255, Issue 5 PART 1, 2008, Pages 1934-1941

  Kiran, M S R N ^a   Krishna, M Ghanashyam ^a   Padmanabhan, K A ^b  

^a UNIVERSITY OF HYDERABAD   (India)

^b ANNA UNIVERSITY   (India)

Author keywords

Optical properties; RF magnetron sputtering; Titanium nitride

Indexed keywords

CRYSTALLITE SIZE; ELECTRIC CONDUCTIVITY; FUSED SILICA; LIGHT ABSORPTION; MAGNETRON SPUTTERING; MORPHOLOGY; NANOCRYSTALS; OPTICAL PROPERTIES; REFRACTIVE INDEX; SURFACE MORPHOLOGY; TITANIUM NITRIDE;

ABSORPTION EDGES; AS-DEPOSITED FILMS; FUSED SILICA SUBSTRATES; OPTICAL ABSORPTION EDGE; POST DEPOSITION ANNEALING; PURE NITROGEN ATMOSPHERE; RF-MAGNETRON SPUTTERING; TEMPERATURE AND PRESSURES;

OPTICAL FILMS;

EID: 56949104718     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.06.122     Document Type: Article

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