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Journal of Alloys and Compounds

Volumn 509, Issue 39, 2011, Pages 9536-9541

Effect of annealing on pulsed laser deposited zirconium oxide thin films

(2) Al Kuhaili, M F a Durrani, S M A a

a KING FAHD UNIVERSITY OF PETROLEUM AND MINERALS (Saudi Arabia)

Author keywords

Annealing; Pulsed laser deposition; Zirconium oxide

Indexed keywords

ABLATED PARTICLES; ANNEALED FILMS; AS-DEPOSITED FILMS; DIRECT BAND GAP; EXTINCTION COEFFICIENTS; INDIRECT BAND GAP; NANOCRYSTALLINES; OPTICAL SPECTROSCOPY; SURFACE DENSITY; TEMPERATURE RANGE; TRANSPARENT FILMS; UNHEATED SUBSTRATES;

ABLATION; AMORPHOUS FILMS; ANNEALING; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DEFECTS; ENERGY GAP; OXIDE FILMS; OXIDES; PHOTOELECTRON SPECTROSCOPY; PULSED LASER DEPOSITION; REFRACTIVE INDEX; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA; ZIRCONIUM;

PULSED LASERS;

EID: 80052033982 PISSN: 09258388 EISSN: None Source Type: Journal
DOI: 10.1016/j.jallcom.2011.07.062 Document Type: Article

Times cited : (21)

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