Thickness-dependent structural and optical properties of sputter deposited ZrO2 films

Optical Materials

Volumn 30, Issue 6, 2008, Pages 910-915

  Zhao, Sha ^a   Ma, Fei ^a   Song, Zhongxiao ^a   Xu, Kewei ^a  

^a XI'AN JIAOTONG UNIVERSITY   (China)

Author keywords

Microstructure; Optical properties; Residual stress; Thickness; Zirconium oxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; MAGNETRON SPUTTERING; MICROSTRUCTURE; OPTICAL PROPERTIES; SPUTTER DEPOSITION; THIN FILMS;

FUNCTIONAL OPTIMIZATION; GLASS SUBSTRATES; MONOCLINIC PHASES; SPUTTERING PROCESS;

ZIRCONIA;

EID: 38649092407     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2007.04.001     Document Type: Article

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