Properties of zirconium oxide films prepared by filtered cathodic vacuum arc deposition and pulsed DC substrate bias

Thin Solid Films

Volumn 518, Issue 18, 2010, Pages 5078-5082

  Martin, P J ^a   Bendavid, A ^a  

^a CSIRO   (Australia)

Author keywords

Filtered cathodic arc deposition; Pulse DC; Refractive index; Zirconium dioxide

Indexed keywords

APPLIED BIAS; CRYSTALLINE PHASE; CRYSTALLINITIES; DC BIAS; FILTERED CATHODIC ARCS; FILTERED CATHODIC VACUUM ARC DEPOSITION; GLASS SUBSTRATES; MICROHARDNESS TESTING; MONOCLINIC TRANSITION; OPTICAL ANALYSIS; PULSE-DC; PULSED DC; PULSED-DC SUBSTRATE BIAS; SILICON SUBSTRATES; ZIRCONIUM DIOXIDE; ZIRCONIUM OXIDE FILMS;

AMORPHOUS FILMS; DEPOSITION; GLASS; GLASS TRANSITION; LIGHT REFRACTION; MICROHARDNESS; REFRACTIVE INDEX; REFRACTOMETERS; SUBSTRATES; VACUUM; VACUUM APPLICATIONS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY; ZIRCONIA; ZIRCONIUM;

OXIDE FILMS;

EID: 77955658393     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.02.067     Document Type: Article

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