-
1
-
-
61549122276
-
Through-silicon via (TSV)
-
Maakoto Motoyoshi, "Through-silicon via (TSV) ", Proceedings of the IEEE, Volume 97, pp. 43-48, 2009.
-
(2009)
Proceedings of the IEEE
, vol.97
, pp. 43-48
-
-
Motoyoshi, M.1
-
3
-
-
61549132828
-
High-density through silicon vias for 3-D LSIs
-
M Koyanagi, T Fukushima, T Tanaka, "High-density through silicon vias for 3-D LSIs", Proceedings of the IEEE, Volume 97, pp. 49-59, 2009.
-
(2009)
Proceedings of the IEEE
, vol.97
, pp. 49-59
-
-
Koyanagi, M.1
Fukushima, T.2
Tanaka, T.3
-
4
-
-
33646236322
-
Three-dimensional wafer stacking via Cu-Cu bonding integrated with 65-nm strained-Si/Low-k CMOS technology
-
P. R. Morrow, C.-M. Park, S. Ramanathan, M. J. Kobrinsky, and M. Harmes, "Three-Dimensional Wafer Stacking Via Cu-Cu Bonding Integrated With 65-nm Strained-Si/Low-k CMOS Technology", IEEE Electron Device Letters, VOL. 27, NO. 5, PP. 335-337, 2006
-
(2006)
IEEE Electron Device Letters
, vol.27
, Issue.5
, pp. 335-337
-
-
Morrow, P.R.1
Park, C.-M.2
Ramanathan, S.3
Kobrinsky, M.J.4
Harmes, M.5
-
5
-
-
54949129447
-
Numerical and experimental investigation of thermomechanical deformation in high-aspect-ratio electroplated through-silicon vias
-
Dixit, P., Sun, Y., Miao, J., Pang, H. L, Chatterjee, R., and Rao R. Tummala, R. R, "Numerical and Experimental Investigation of Thermomechanical Deformation in High-Aspect-Ratio Electroplated Through-Silicon Vias", J. Electrochem. Soc., Volume 155, Issue 12, pp. H981-H986 (2008).
-
(2008)
J. Electrochem. Soc.
, vol.155
, Issue.12
-
-
Dixit, P.1
Sun, Y.2
Miao, J.3
Pang, H.L.4
Chatterjee, R.5
Rao, R.6
Tummala, R.R.7
-
6
-
-
54049120009
-
TSV constraints related to temperature excursion, pressure during molding, materials used and handling loads
-
January 10
-
Tomasz, F., Kazimierz, F., Norman, M., Stephan, W., "TSV constraints related to temperature excursion, pressure during molding, materials used and handling loads", Microsystem Technologies, Volume 15, Number 1, January 2009, pp. 181-190 (10).
-
(2009)
Microsystem Technologies
, vol.15
, Issue.1
, pp. 181-190
-
-
Tomasz, F.1
Kazimierz, F.2
Norman, M.3
Stephan, W.4
-
7
-
-
34250797327
-
Thermo-mechanical reliability of 3d-integrated microstructures in stacked silicon
-
Paper 0970-Y02-04
-
Wunderle, B., Mrossko, R., Wittler, O., Kaulfersch, E., Ramm, P., Michel, B., Reichl, H., "Thermo-Mechanical Reliability of 3D-integrated Microstructures in Stacked Silicon", Materials Research Society symposia proceedings, vol. 970, Paper 0970-Y02-04.
-
Materials Research Society Symposia Proceedings
, vol.970
-
-
Wunderle, B.1
Mrossko, R.2
Wittler, O.3
Kaulfersch, E.4
Ramm, P.5
Michel, B.6
Reichl, H.7
-
8
-
-
47249163302
-
A study of thermo-mechanical stress and its impact on through-silicon vias
-
Ranganathan, N., Prasad, K., Balasubramanian, N., Pey, K. L, "A study of thermo-mechanical stress and its impact on through-silicon vias", Journal of Micromechanics and Microengineering, (13pp) 2008.
-
(2008)
Journal of Micromechanics and Microengineering
-
-
Ranganathan, N.1
Prasad, K.2
Balasubramanian, N.3
Pey, K.L.4
-
9
-
-
51349168308
-
Nonlinear thermal stress/strain analyses of copper filled TSV (through silicon via) and their flip-chip microbumps
-
Selvanayagam, C. S., Lau, J. H., Zhang, X., Seah, S. K. W., Vaidyanathan, K., Chai, T. C., "Nonlinear thermal stress/strain analyses of copper filled TSV (through silicon via) and their flip-chip microbumps", Electronic Components and Technology Conference, 2008. ECTC 2008. 1073-1081.
-
(2008)
Electronic Components and Technology Conference, 2008. ECTC
, pp. 1073-1081
-
-
Selvanayagam, C.S.1
Lau, J.H.2
Zhang, X.3
Seah, S.K.W.4
Vaidyanathan, K.5
Chai, T.C.6
-
10
-
-
51349168308
-
Nonlinear thermal stress/strain analyses of copper filled TSV (Through Silicon Via) and their flip-chip microbumps
-
Cheryl S. Selvanayagam, John H. Lau, Xiaowu Zhang, S. K. W. Seah, Kripesh Vaidyanathan, and T. C. Chai, "Nonlinear Thermal Stress/Strain Analyses of Copper Filled TSV (Through Silicon Via) and their Flip-Chip Microbumps", IEEE Transactions on Advanced Packaging, pp. 1073-1081, 2008
-
(2008)
IEEE Transactions on Advanced Packaging
, pp. 1073-1081
-
-
Selvanayagam, C.S.1
Lau, J.H.2
Zhang, X.3
Seah, S.K.W.4
Vaidyanathan, K.5
Chai, T.C.6
-
11
-
-
70349675218
-
Failure mechanisms and optimum design for electroplated copper through-silicon vias (TSV)
-
San Diego, CA, May
-
Xi Liu, Qiao Chen, Pradeep Dixit, Ritwik Chatterjee, Rao R. Tummala, and Suresh K. Sitaraman, "Failure Mechanisms and Optimum Design for Electroplated Copper Through-Silicon Vias (TSV) ", 59th Electronic Components and Technology Conference, San Diego, CA, May, 2009
-
(2009)
59th Electronic Components and Technology Conference
-
-
Liu, X.1
Chen, Q.2
Dixit, P.3
Chatterjee, R.4
Tummala, R.R.5
Sitaraman, S.K.6
-
12
-
-
84881462684
-
Reliable design of electroplated copper through silicon vias
-
Vancouver, Canada, November
-
Xi Liu, Qiao Chen, Venkatesh Sundaram, Sriram Muthukumar, Rao R. Tummala, and Suresh K. Sitaraman, "Reliable design of electroplated copper through silicon vias", ASME international mechanical engineering congress & exposition (IMECE), Vancouver, Canada, November, 2010
-
(2010)
ASME International Mechanical Engineering Congress & Exposition (IMECE)
-
-
Liu, X.1
Chen, Q.2
Sundaram, V.3
Muthukumar, S.4
Tummala, R.R.5
Sitaraman, S.K.6
-
13
-
-
77955545892
-
Hygro-thermo-mechanical reliability assessment of a thermal interface material for a ball grid array package assembly
-
Xi Liu, Jiantao Zheng, Suresh K. Sitaraman, "Hygro-Thermo-Mechanical Reliability Assessment of a Thermal Interface Material for a Ball Grid Array Package Assembly", Journal of Electronic Packaging, Vol. 132, 2010
-
(2010)
Journal of Electronic Packaging
, vol.132
-
-
Liu, X.1
Zheng, J.2
Sitaraman, S.K.3
-
14
-
-
77955187970
-
Thermal stress induced delamination of through silicon vias in 3-D interconnects
-
Las Vegas, May
-
Kuan H. Lu, Suk-Kyu Ryu, Qiu Zhao, Xuefeng Zhang, Jay Im, Rui Huang, Paul S. Ho, "Thermal Stress Induced Delamination of Through Silicon Vias in 3-D Interconnects", 60th Electronic Components and Technology Conference, Las Vegas, May, 2010
-
(2010)
60th Electronic Components and Technology Conference
-
-
Lu, K.H.1
Ryu, S.2
Zhao, Q.3
Zhang, X.4
Im, J.5
Huang, R.6
Ho, P.S.7
-
15
-
-
74649084179
-
Thermomechanical reliability study of flip chip solder bumps: Using laser ultrasound technique and finite element method
-
Nov
-
Jin Yang, and I. Charles Ume, "Thermomechanical Reliability Study of Flip Chip Solder Bumps: Using Laser Ultrasound Technique and Finite Element Method", IEEE Transactions on Advanced Packaging, Vol. 32, No. 4, pp. 729-739, Nov. 2009.
-
(2009)
IEEE Transactions on Advanced Packaging
, vol.32
, Issue.4
, pp. 729-739
-
-
Yang, J.1
Charles Ume, I.2
-
16
-
-
77955177753
-
Sensitivity analysis of Pb free reflow profile parameters toward flip chip on silicon assembly yield, reliability and intermetallic compound characteristics
-
th Electronic Components and Technology Conference (ECTC), 2010
-
(2010)
th Electronic Components and Technology Conference (ECTC)
-
-
Li, Z.1
Lee, S.2
Lewis, B.J.3
Houston, P.N.4
Baldwin, D.F.5
Stout, G.6
Tessier, T.7
Evans, J.L.8
-
17
-
-
70349680427
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Processing and reliability characterization of a 3D-WLCSP packaged component
-
San Diego, CA, May 26-29
-
Zhaozhi Li, Paul Houston, Daniel Baldwin, Gene Stout, Ted Tessier and John Evans, "Processing and Reliability Characterization of a 3D-WLCSP Packaged Component", Proceedings of the 59th Electronic Components and Technology Conference, San Diego, CA, May 26-29, 2009.
-
(2009)
Proceedings of the 59th Electronic Components and Technology Conference
-
-
Li, Z.1
Houston, P.2
Baldwin, D.3
Stout, G.4
Tessier, T.5
Evans, J.6
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