-
1
-
-
7444220645
-
Electric field in atomically thin carbon films
-
DOI 10.1126/science.1102896
-
Novoselov, K. S.; Geim, A. K.; Morozov, S. V.; Jiang, D.; Zhang, Y.; Dubonors, S. V.; Grigorieva, I. V.; Firsov, A. A. Electric Field Effect in Atomically Thin Carbon Films Science 2004, 306, 666-669 (Pubitemid 39440910)
-
(2004)
Science
, vol.306
, Issue.5696
, pp. 666-669
-
-
Novoselov, K.S.1
Geim, A.K.2
Morozov, S.V.3
Jiang, D.4
Zhang, Y.5
Dubonos, S.V.6
Grigorieva, I.V.7
Firsov, A.A.8
-
2
-
-
33847690144
-
The rise of graphene
-
DOI 10.1038/nmat1849, PII NMAT1849
-
Geim, A. K.; Novoselov, K. L. The Rise of Graphene Nat. Mater. 2007, 6, 183-191 (Pubitemid 46353764)
-
(2007)
Nature Materials
, vol.6
, Issue.3
, pp. 183-191
-
-
Geim, A.K.1
Novoselov, K.S.2
-
3
-
-
59949098337
-
The Electronic Properties of Graphene
-
Castro Neto, A. H.; Guinea, F.; Peres, N. M. R.; Novoselov, K. S.; Geim, A. K. The Electronic Properties of Graphene Rev. Mod. Phys. 2009, 81, 109-162
-
(2009)
Rev. Mod. Phys.
, vol.81
, pp. 109-162
-
-
Castro Neto, A.H.1
Guinea, F.2
Peres, N.M.R.3
Novoselov, K.S.4
Geim, A.K.5
-
4
-
-
77955231284
-
Graphene Transistor
-
Schwierz, F. Graphene Transistor Nat. Nanotechnol. 2010, 5, 487-496
-
(2010)
Nat. Nanotechnol.
, vol.5
, pp. 487-496
-
-
Schwierz, F.1
-
5
-
-
78449299206
-
Graphene: Electronic and Photonic Properties and Devices
-
Avouris, Ph. Graphene: Electronic and Photonic Properties and Devices Nano Lett. 2010, 10, 4285-4294
-
(2010)
Nano Lett.
, vol.10
, pp. 4285-4294
-
-
Avouris, Ph.1
-
6
-
-
76249106631
-
100-GHz Transistors from Wafer-Scale Epitaxial Graphene
-
Lin, Y.-M.; Dimitrakopoulos, C.; Jenkins, K. A.; Farmer, D. B.; Chiu, H.-Y.; Grill, A.; Avouris, Ph. 100-GHz Transistors from Wafer-Scale Epitaxial Graphene Science 2010, 327, 662-662
-
(2010)
Science
, vol.327
, pp. 662-662
-
-
Lin, Y.-M.1
Dimitrakopoulos, C.2
Jenkins, K.A.3
Farmer, D.B.4
Chiu, H.-Y.5
Grill, A.6
Avouris, Ph.7
-
7
-
-
77956939304
-
High-Speed, Graphene Transistors with a Self-Aligned Nanowire Gate
-
Liao, L.; Lin, Y.-C.; Bao, M.; Cheng, R.; Bai, J.; Liu, Y.; Qu, Y.; Wang, K. L.; Huang, Y.; Duan, X. High-Speed, Graphene Transistors with a Self-Aligned Nanowire Gate Nature 2010, 467, 305-308
-
(2010)
Nature
, vol.467
, pp. 305-308
-
-
Liao, L.1
Lin, Y.-C.2
Bao, M.3
Cheng, R.4
Bai, J.5
Liu, Y.6
Qu, Y.7
Wang, K.L.8
Huang, Y.9
Duan, X.10
-
8
-
-
78049322528
-
Triple-Mode Single-Transistor Graphene Amplifier and Its Applications
-
Yang, X.; Liu, G.; Balandin, A. A.; Mohanram, K. Triple-Mode Single-Transistor Graphene Amplifier and Its Applications ACS Nano 2010, 4, 5532-5538
-
(2010)
ACS Nano
, vol.4
, pp. 5532-5538
-
-
Yang, X.1
Liu, G.2
Balandin, A.A.3
Mohanram, K.4
-
9
-
-
67349236231
-
Graphene Frequency Multipliers
-
Wang, H.; Nezich, D.; Kong, J.; Palacios, T. Graphene Frequency Multipliers IEEE Electron Device Lett. 2009, 30, 547-549
-
(2009)
IEEE Electron Device Lett.
, vol.30
, pp. 547-549
-
-
Wang, H.1
Nezich, D.2
Kong, J.3
Palacios, T.4
-
10
-
-
77952392490
-
A High-Performance Top-Gate Graphene Field-Effect Transistor Based Frequency Doubler
-
Wang, Z. X.; Zhang, Z. Y.; Xu, H. L.; Ding, L.; Wang, S.; Peng, L.-M. A High-Performance Top-Gate Graphene Field-Effect Transistor Based Frequency Doubler Appl. Phys. Lett. 2010, 96, 173104
-
(2010)
Appl. Phys. Lett.
, vol.96
, pp. 173104
-
-
Wang, Z.X.1
Zhang, Z.Y.2
Xu, H.L.3
Ding, L.4
Wang, S.5
Peng, L.-M.6
-
11
-
-
46049105319
-
Atomic layer deposition of metal oxides on pristine and functionalized graphene
-
DOI 10.1021/ja8023059
-
Wang, X. R.; Tabakman, S. M.; Dai, H. J. Atomic Layer Deposition of Metal Oxides on Pristine and Functionalized Graphene J. Am. Chem. Soc. 2008, 130, 8152-8153 (Pubitemid 351898526)
-
(2008)
Journal of the American Chemical Society
, vol.130
, Issue.26
, pp. 8152-8153
-
-
Wang, X.1
Tabakman, S.M.2
Dai, H.3
-
12
-
-
44349165054
-
3 Dielectric Layer Deposited by Atomic Layer Deposition for Graphene-Based Nanoelectronics
-
3 Dielectric Layer Deposited by Atomic Layer Deposition for Graphene-Based Nanoelectronics Appl. Phys. Lett. 2008, 92, 203102
-
(2008)
Appl. Phys. Lett.
, vol.92
, pp. 203102
-
-
Lee, B.K.1
Park, S.-Y.2
Kim, H.-C.3
Cho, K.J.4
Vogel, E.M.5
Kim, M.J.6
Wallace, R.M.7
Kim, J.Y.8
-
13
-
-
57349090160
-
Current Saturation in Zero-Bandgap, Top-Gated Graphene Field-Effect Transistors
-
Meric, I.; Han, M. Y.; Young, A. F.; Ozyilmaz, B.; Kim, P.; Shepard, K. L. Current Saturation in Zero-Bandgap, Top-Gated Graphene Field-Effect Transistors Nat. Nanotechnol. 2008, 3, 654-659
-
(2008)
Nat. Nanotechnol.
, vol.3
, pp. 654-659
-
-
Meric, I.1
Han, M.Y.2
Young, A.F.3
Ozyilmaz, B.4
Kim, P.5
Shepard, K.L.6
-
14
-
-
60349109113
-
3 Dielectric
-
3 Dielectric Appl. Phys. Lett. 2009, 94, 062107
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 062107
-
-
Kim, S.1
Nah, J.2
Jo, I.3
Shahrjerdi, D.4
Colombo, L.5
Yao, Z.6
Tutuc, E.7
Banerjee, S.8
-
15
-
-
71949095395
-
Utilization of a Buffered Dielectric to Achieve High Field-Effect Carrier Mobility in Graphene Transistors
-
Farmer, D. B.; Chiu, H.-Y.; Lin, Y.-M.; Jenkins, K. A.; Xia, F. N.; Avouris, P. Utilization of a Buffered Dielectric To Achieve High Field-Effect Carrier Mobility in Graphene Transistors Nano Lett. 2009, 9, 4474-4478
-
(2009)
Nano Lett.
, vol.9
, pp. 4474-4478
-
-
Farmer, D.B.1
Chiu, H.-Y.2
Lin, Y.-M.3
Jenkins, K.A.4
Xia, F.N.5
Avouris, P.6
-
16
-
-
77951044011
-
High-? Oxide Nanoribbons as Gate Dielectrics for High Mobility Top-Gated Graphene Transistors
-
Liao, L.; Bai, J. W.; Qu, Y. Q.; Lin, Y. C.; Li, Y. J.; Huang, Y.; Duan, X. F. High-? Oxide Nanoribbons as Gate Dielectrics for High Mobility Top-Gated Graphene Transistors Proc. Natl. Acad. Sci. U.S.A. 2010, 107, 6711-6715
-
(2010)
Proc. Natl. Acad. Sci. U.S.A.
, vol.107
, pp. 6711-6715
-
-
Liao, L.1
Bai, J.W.2
Qu, Y.Q.3
Lin, Y.C.4
Li, Y.J.5
Huang, Y.6
Duan, X.F.7
-
17
-
-
77950084994
-
Top-Gated Epitaxial Graphene FETs on Si-Face SiC Wafers with a Peak Transconductance of 600 mS/mm
-
et al.
-
Moon, J. S.; Curtis, D.; Bui, S.; Hu, M.; Gaskill, D. K.; Tedesco, J. L.; Asbeck, P. A.; Jernigan, G. G.; VanMil, B. L.; Myers-Ward, R. L.; et al. Top-Gated Epitaxial Graphene FETs on Si-Face SiC Wafers with a Peak Transconductance of 600 mS/mm IEEE Electron Device Lett. 2010, 31, 260-262
-
(2010)
IEEE Electron Device Lett.
, vol.31
, pp. 260-262
-
-
Moon, J.S.1
Curtis, D.2
Bui, S.3
Hu, M.4
Gaskill, D.K.5
Tedesco, J.L.6
Asbeck, P.A.7
Jernigan, G.G.8
Vanmil, B.L.9
Myers-Ward, R.L.10
-
18
-
-
77957107491
-
Density of States and Zero Landau Level Probed through Capacitance of Graphene
-
Ponomarenko, L. A.; Yang, R.; Gorbachev, R. V.; Blake, P.; Katsnelson, M. I.; Novoselov, K. S.; Geim, A. K. Density of States and Zero Landau Level Probed through Capacitance of Graphene Phys. Rev. Lett. 2010, 108, 136801
-
(2010)
Phys. Rev. Lett.
, vol.108
, pp. 136801
-
-
Ponomarenko, L.A.1
Yang, R.2
Gorbachev, R.V.3
Blake, P.4
Katsnelson, M.I.5
Novoselov, K.S.6
Geim, A.K.7
-
19
-
-
77953310895
-
Growth and Performance of Yttrium Oxide as a Perfect High-? Gate Dielectric for Carbon-Based Electronics
-
et al.
-
Wang, Z. X.; Xu, H. L.; Zhang, Z. Y.; Wang, S.; Ding, L.; Zeng, Q. S.; Yang, L. J.; Pei, T.; Liang, X. L.; Gao, M.; et al. Growth and Performance of Yttrium Oxide as a Perfect High-? Gate Dielectric for Carbon-Based Electronics Nano Lett. 2010, 10, 2024-2030
-
(2010)
Nano Lett.
, vol.10
, pp. 2024-2030
-
-
Wang, Z.X.1
Xu, H.L.2
Zhang, Z.Y.3
Wang, S.4
Ding, L.5
Zeng, Q.S.6
Yang, L.J.7
Pei, T.8
Liang, X.L.9
Gao, M.10
-
20
-
-
79952961488
-
Quantum Capacitance Limited Vertical Scaling of Graphene Field Effect Transistor
-
Xu, H. L.; Zhang, Z. Y.; Wang, Z. X.; Wang, S.; Liang, X. L.; Peng, L.-M. Quantum Capacitance Limited Vertical Scaling of Graphene Field Effect Transistor ACS Nano 2011, 5, 2340-2347
-
(2011)
ACS Nano
, vol.5
, pp. 2340-2347
-
-
Xu, H.L.1
Zhang, Z.Y.2
Wang, Z.X.3
Wang, S.4
Liang, X.L.5
Peng, L.-M.6
-
21
-
-
79953765858
-
Measurements and Microscopic Model of Quantum Capacitance in Graphene
-
Xu, H. L.; Zhang, Z. Y.; Peng, L. M. Measurements and Microscopic Model of Quantum Capacitance in Graphene Appl. Phys. Lett. 2011, 98, 133122
-
(2011)
Appl. Phys. Lett.
, vol.98
, pp. 133122
-
-
Xu, H.L.1
Zhang, Z.Y.2
Peng, L.M.3
-
22
-
-
77956159400
-
Influence of Metal Work Function on the Position of the Dirac Point of Graphene Field-Effect Transistors
-
Park, N.; Kim, B.-Y.; Lee, J.-O; Kim, J.-J. Influence of Metal Work Function on the Position of the Dirac Point of Graphene Field-Effect Transistors Appl. Phys. Lett. 2009, 95, 243105
-
(2009)
Appl. Phys. Lett.
, vol.95
, pp. 243105
-
-
Park, N.1
Kim, B.-Y.2
Lee, J.-O.3
Kim, J.-J.4
-
23
-
-
61649099616
-
Self-Aligned Ballistic n-Type Single-Walled Carbon Nanotube Field-Effect Transistors with Adjustable Threshold Voltage
-
et al.
-
Zhang, Z. Y.; Wang, S.; Ding, L.; Liang, X. L.; Pei, T.; Shen, J.; Xu, H. L.; Chen, Q.; Cui, R. L.; Li, Y.; et al. Self-Aligned Ballistic n-Type Single-Walled Carbon Nanotube Field-Effect Transistors with Adjustable Threshold Voltage Nano Lett. 2008, 8, 3696-3701
-
(2008)
Nano Lett.
, vol.8
, pp. 3696-3701
-
-
Zhang, Z.Y.1
Wang, S.2
Ding, L.3
Liang, X.L.4
Pei, T.5
Shen, J.6
Xu, H.L.7
Chen, Q.8
Cui, R.L.9
Li, Y.10
-
25
-
-
78650122340
-
2 Substrate
-
2 Substrate Nano Lett. 2010, 10, 4944-4951
-
(2010)
Nano Lett.
, vol.10
, pp. 4944-4951
-
-
Ryu, S.1
Liu, L.2
Berciaud, S.3
Yu, Y.J.4
Liu, H.5
Kim, P.6
Flynn, G.W.7
Brus, L.E.8
-
26
-
-
27744475163
-
Experimental observation of the quantum Hall effect and Berry's phase in graphene
-
DOI 10.1038/nature04235, PII N04235
-
Zhang, Y. B.; Tan, Y.-W.; Stormer, H. L.; Kim, P. Experimental Observation of the Quantum Hall Effect and Berrys Phase in Graphene Nature 2005, 438, 201-204 (Pubitemid 41599868)
-
(2005)
Nature
, vol.438
, Issue.7065
, pp. 201-204
-
-
Zhang, Y.1
Tan, Y.-W.2
Stormer, H.L.3
Kim, P.4
-
27
-
-
51749110481
-
Evidence of the Role of Contacts on the Observed Electron-Hole Asymmetry in Graphene
-
Huard, B.; Stander, N.; Sulpizio, J. A.; Goldhaber-Gordon, D. Evidence of the Role of Contacts on the Observed Electron-Hole Asymmetry in Graphene Phys. Rev. B 2008, 78, 121402
-
(2008)
Phys. Rev. B
, vol.78
, pp. 121402
-
-
Huard, B.1
Stander, N.2
Sulpizio, J.A.3
Goldhaber-Gordon, D.4
-
28
-
-
54149109422
-
Transfer Characteristics in Graphene Field-Effect Transistors with Co Contacts
-
Nouchi, R.; Shiraishi, M.; Suzuki, Y. Transfer Characteristics in Graphene Field-Effect Transistors with Co Contacts Appl. Phys. Lett. 2008, 93, 152104
-
(2008)
Appl. Phys. Lett.
, vol.93
, pp. 152104
-
-
Nouchi, R.1
Shiraishi, M.2
Suzuki, Y.3
-
29
-
-
61749091308
-
Chemical Doping and Electron-Hole Conduction Asymmetry in Graphene Devices
-
Farmer, D. B.; Golizadeh-Mojarad, R.; Pereheinos, V.; Lin, Y.-M.; Tulevski, G. S.; Tsang, J. C.; Avouris, Ph. Chemical Doping and Electron-Hole Conduction Asymmetry in Graphene Devices Nano Lett. 2009, 9, 388-392
-
(2009)
Nano Lett.
, vol.9
, pp. 388-392
-
-
Farmer, D.B.1
Golizadeh-Mojarad, R.2
Pereheinos, V.3
Lin, Y.-M.4
Tulevski, G.S.5
Tsang, J.C.6
Avouris, Ph.7
-
30
-
-
37249020423
-
Measurement of Scattering Rate and Minimum Conductivity in Graphene
-
Tan, Y.-W.; Zhang, Y.; Bolotin, K.; Zhao, Y.; Adam, S.; Hwang, E. H.; Sarma, S. D.; Stormer, H. L.; Kim, P. Measurement of Scattering Rate and Minimum Conductivity in Graphene Phys. Rev. Lett. 2007, 99, 246803
-
(2007)
Phys. Rev. Lett.
, vol.99
, pp. 246803
-
-
Tan, Y.-W.1
Zhang, Y.2
Bolotin, K.3
Zhao, Y.4
Adam, S.5
Hwang, E.H.6
Sarma, S.D.7
Stormer, H.L.8
Kim, P.9
-
31
-
-
43149118786
-
Charged-Impurity Scattering in Graphene
-
Chen, J. H.; Jang, C.; Adam, S.; Fuhrer, M. S.; Williams, E. D. Charged-Impurity Scattering in Graphene Nat. Phys. 2008, 4, 377-381
-
(2008)
Nat. Phys.
, vol.4
, pp. 377-381
-
-
Chen, J.H.1
Jang, C.2
Adam, S.3
Fuhrer, M.S.4
Williams, E.D.5
-
32
-
-
36749055294
-
A self-consistent theory for graphene transport
-
DOI 10.1073/pnas.0704772104
-
Adam, S.; Wang, E. H.; Galitski, V. M.; Darma, S. D. A Self-Consistent Theory for Graphene Transport Proc. Natl. Acad. Sci. U.S.A. 2007, 104, 18392-18397 (Pubitemid 350210707)
-
(2007)
Proceedings of the National Academy of Sciences of the United States of America
, vol.104
, Issue.47
, pp. 18392-18397
-
-
Adam, S.1
Hwang, E.H.2
Galitski, V.M.3
Das Sarma, S.4
-
33
-
-
34247889934
-
Carrier Transport in Two-Dimensional Graphene Layers
-
Hwang, E. H.; Adam, S.; Sarma, S. D. Carrier Transport in Two-Dimensional Graphene Layers Phys. Rev. Lett. 2007, 98, 186806
-
(2007)
Phys. Rev. Lett.
, vol.98
, pp. 186806
-
-
Hwang, E.H.1
Adam, S.2
Sarma, S.D.3
-
34
-
-
78650156443
-
Controlling Electron-Phonon Interactions in Graphene at Ultrahigh Carrier Densities
-
Efetov, D. K.; Kim, P. Controlling Electron-Phonon Interactions in Graphene at Ultrahigh Carrier Densities Phys. Rev. Lett. 2010, 105, 256805
-
(2010)
Phys. Rev. Lett.
, vol.105
, pp. 256805
-
-
Efetov, D.K.1
Kim, P.2
-
35
-
-
77958052204
-
Sub-100 nm Channel Length Graphene Transistors
-
Liao, L.; Bai, J.; Cheng, R.; Lin, Y.-C.; Jiang, S.; Qu, Y.; Huang, Y.; Duan, X. Sub-100 nm Channel Length Graphene Transistors Nano Lett. 2010, 10, 3952-3956
-
(2010)
Nano Lett.
, vol.10
, pp. 3952-3956
-
-
Liao, L.1
Bai, J.2
Cheng, R.3
Lin, Y.-C.4
Jiang, S.5
Qu, Y.6
Huang, Y.7
Duan, X.8
-
37
-
-
77954732824
-
Graphene Field-Effect Transistors with Self-Aligned Gates
-
Farmer, D. B.; Lin, Y.-M.; Avouris, Ph. Graphene Field-Effect Transistors with Self-Aligned Gates Appl. Phys. Lett. 2010, 97, 013103
-
(2010)
Appl. Phys. Lett.
, vol.97
, pp. 013103
-
-
Farmer, D.B.1
Lin, Y.-M.2
Avouris, Ph.3
-
38
-
-
77952329312
-
Metal/Graphene Contact as a Performance Killer of Ultra-high Mobility Graphene - Analysis of Intrinsic Mobility and Contact Resistance
-
5424297, Baltimore, MD.
-
Nagashio, K.; Nishimura, T.; Kita, K.; Toriumi, A. Metal/Graphene Contact as a Performance Killer of Ultra-high Mobility Graphene - Analysis of Intrinsic Mobility and Contact Resistance. IEEE International Electron Devices Meeting, 2009, 5424297, Baltimore, MD.
-
(2009)
IEEE International Electron Devices Meeting
-
-
Nagashio, K.1
Nishimura, T.2
Kita, K.3
Toriumi, A.4
-
39
-
-
0031122158
-
CMOS Scaling into the Nanometer Regime
-
et al.
-
Taur, Y.; Buchanan, D. A.; Chen, W.; Frank, D. J.; Ismail, K. E.; LO, S.; Sai-Halasz, G. A.; Viswanathan, R. G.; Wann, H. C.; Wind, S. J.; et al. CMOS Scaling into the Nanometer Regime Proc. IEEE 1997, 85, 486-504
-
(1997)
Proc. IEEE
, vol.85
, pp. 486-504
-
-
Taur, Y.1
Buchanan, D.A.2
Chen, W.3
Frank, D.J.4
Ismail, K.E.5
Lo, S.6
Sai-Halasz, G.A.7
Viswanathan, R.G.8
Wann, H.C.9
Wind, S.J.10
-
40
-
-
0036609910
-
Effects of high-κ gate dielectric materials on metal and silicon gate workfunctions
-
DOI 10.1109/LED.2002.1004229, PII S0741310602051844
-
Yeo, Y. C.; Ranade, P.; King, T. J.; Hu, C. M. Effects of High-k Gate Dielectric Materials on Metal and Silicon Gate Workfunctions IEEE Electron Device Lett. 2002, 23, 342-344 (Pubitemid 34731964)
-
(2002)
IEEE Electron Device Letters
, vol.23
, Issue.6
, pp. 342-344
-
-
Yeo, Y.-C.1
Ranade, P.2
King, T.-J.3
Hu, C.4
-
41
-
-
31044455312
-
High dielectric constant gate oxides for metal oxide Si transistors
-
DOI 10.1088/0034-4885/69/2/R02, PII S0034488506721856
-
Robertson, J. High Dielectric Constant Gate Oxides for Metal Oxide Si Transistors Rep. Prog. Phys. 2006, 69, 327-396 (Pubitemid 43121643)
-
(2006)
Reports on Progress in Physics
, vol.69
, Issue.2
, pp. 327-396
-
-
Robertson, J.1
|