Characterization of the properties of high-energy electron irradiated Al-doped ZnO thin films prepared by rf magnetron sputtering using Ar plasma

Surface and Coatings Technology

Volumn 205, Issue 21-22, 2011, Pages 5130-5134

  Yun, Eui Jung ^a   Jung, Jin Woo ^a   Lee, Byung Cheol ^b   Jung, Myunghee ^c  

^a Hoseo University   (South Korea)

^b Korea Atomic Energy Research Institute   (South Korea)

^c Anyang University   (South Korea)

Author keywords

AZO; Electron beam irradiation effects; Luminescence; Photoelectron spectroscopies; Thin films

Indexed keywords

AL-DOPED ZNO; AR PLASMAS; ARGON PLASMAS; ATOMIC FORCE MICROSCOPES; AZO; AZO FILMS; ELECTRON BEAM IRRADIATION EFFECTS; ELECTRON CONCENTRATION; FLUENCES; GRAIN SIZE; HIGH ENERGY ELECTRON BEAM IRRADIATION; HIGH QUALITY; HIGH-ENERGY ELECTRON; INTERSTITIALS; N-TYPE CONDUCTIVITY; PHOTOLUMINESCENCE MEASUREMENTS; RADIO FREQUENCY MAGNETRON SPUTTERING; RF-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SCANNING ELECTRON MICROSCOPE; ZINC VACANCY;

ALUMINUM; ARGON; ATOMIC FORCE MICROSCOPY; ELECTRON BEAMS; ELECTRONS; GALVANOMAGNETIC EFFECTS; HALL MOBILITY; HIGH ENERGY PHYSICS; IRRADIATION; MAGNETRON SPUTTERING; OPTICAL FILMS; PHOTOELECTRICITY; PHOTOELECTRON SPECTROSCOPY; PHOTONS; SCANNING ELECTRON MICROSCOPY; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

FILM PREPARATION;

EID: 79959525037     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2011.05.021     Document Type: Article

References (30)

1. Ko H., Tai W.-P., Kim K.-C., Im S.-I., Kim S.-H., Suh S.-J., Kim Y.-S. J. Cryst. Growth 2005, 277:352.
2. Moon C.S., Chung Y.M., Jung W.S., Han J.G. Surf. Coat. Technol. 2007, 201:5035.
3. Lee J.-H., Song J.-T. Thin Solid Films 2008, 516:1377.
4. Lee K.E., Wang M., Kim E.J., Hahn S.H. Curr. Appl. Phys. 2009, 9:683.
5. Li C., Furuta M., Matsuda T., Hiramatsu T., Furuta H., Hirao T. Thin Solid Films 2009, 517:3265.
6. Lin Y.C., Chen M.Z., Kuo C.C., Yen W.T. Colloids Surf. 2009, A337:52.
7. Fernández S., Martínez-Steele A., Gandía J.J., Naranjo F.B. Thin Solid Films 2009, 517:3152.
8. Lee D.U., Kim E.K., Lee B.C., Oh D.K. Thin Solid Films 2008, 516:3482.
9. Vlasenko L.S., Watkins G.D. Phys. Rev. B: Condens. Matter 2005, 71:125210.
10. Gür E., Asil H., Coskun C., Tüzemen S., Meral K., Onganer Y., Serifoglu K. Nucl. Instrum. Methods. Phys. Res., Sect. B 2008, 266:2021.
11. Yun E.-J., Jung J.W., Cheon C.I., Kim J.S., Han Y.H., Kim M.-W., Lee B.C. J. Mater. Res. 2009, 24:1785.
12. Yun E.-J., Jung J.W., Han Y.H., Kim M.-W., Lee B.C. J. Appl. Phys. 2009, 105:123509.
13. Li Y.J., Kwon Y.W., Jones M., Heo Y.W., Zhou J., Luo S.C., Holloway P.H., Douglas E., Norton D.P., Park Z., Li S. Semicond. Sci. Technol. 2005, 20:720.
14. Paine D.C., Yaglioglu B., Beiley Z., Lee S. Thin Solid Films 2008, 516:5894.
15. Hu G., Gong H., Chor E.F., Wu P. Appl. Phys. Lett. 2006, 89:251102.
16. Yun E.-J., Park H.-S., Lee K.H., Nam H.G., Jung M. J. Appl. Phys. 2008, 103:073507.
17. Wei X.Q., Man B.Y., Liu M., Xue C.S., Zhuang H.Z., Yang C. Physica B 2007, 388:145.
18. Xing G.Z., Yao B., Cong C.X., Yang T., Xie Y.P., Li B.H., Shen D.Z. J. Alloys Compd. 2008, 457:36.
19. Fan D.H., Ning Z.Y., Jiang M.F. Appl. Surf. Sci. 2005, 245:414.
20. Priller H., Decker M., Hauschild R., Kalt H., Klingshirn C. Appl. Phys. Lett. 2005, 86:111909.
21. Xue S.W., Zu X.T., Zheng W.G., Chen M.Y., Xiang X. Physica B 2006, 382:201.
22. Reshchikov M.A., Morkoc H., Nemeth B., Nause J., Xie J., Hertog B., Osinsky A. Physica B 2007, 401-402:358.
23. Kong D.H., Choi W.C., Shin Y.C., Park J.H., Kim T.G. J. Korean Phys. Soc. 2006, 48:1214.
24. Lin Y.-J., Tsai C.-L., Lu Y.-M., Liu C.-J. J. Appl. Phys. 2006, 99:093501.
25. Zeng Y.J., Ye Z.Z., Xu W.Z., Liu B., Che Y., Zhu L.P., Zhao B.H. Mater. Lett. 2007, 61:41.
26. Ahn B.D., Oh S.H., Lee C.H., Kim G.H., Kim H.J., Lee S.Y. J. Cryst. Growth 2007, 309:128.
27. Yang W., Liu Z., Peng D.-L., Zhang F., Huang H., Xie Y., Wu Z. Appl. Surf. Sci. 2009, 255:5669.
28. NIST XPS Database, Selected Element Search Result; http://srdata.nist.gov/xps.
29. Yun E.-J., Park H.-S., Cha K.-H., Lee K.H., Cho N.-I., Nam H.G. J. Korean Phys. Soc. 2008, 52:606.
30. He H.P., Zhuge F., Ye Z.Z., Zhu L.P., Wang F.Z., Zhao B.H., Huang J.Y. J. Appl. Phys. 2006, 99:023503.