Effects of substrate on the structural, electrical and optical properties of Al-doped ZnO films prepared by radio frequency magnetron sputtering

Thin Solid Films

Volumn 517, Issue 11, 2009, Pages 3265-3268

  Li, C ^a   Furuta, M ^a   Matsuda, T ^a   Hiramatsu, T ^a   Furuta, H ^a   Hirao, T ^a  

^a KOCHI UNIVERSITY OF TECHNOLOGY   (Japan)

Author keywords

Al doped zinc oxide; Electrical properties and measurements; Radio frequency magnetron sputtering; Substrates selection; Thickness; Transmittance; X ray diffraction

Indexed keywords

ALUMINUM; BUFFER LAYERS; CARRIER CONCENTRATION; CONDUCTIVE FILMS; DIFFRACTION; ELECTRIC PROPERTIES; ELECTRODEPOSITION; GALVANOMAGNETIC EFFECTS; GLASS; HALL MOBILITY; LATTICE MISMATCH; LIGHT; MAGNETRON SPUTTERING; MAGNETRONS; OPTICAL FILMS; OPTICAL PROPERTIES; ORGANIC LIGHT EMITTING DIODES (OLED); OXIDE MINERALS; QUARTZ; RADIO; RADIO WAVES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTING ZINC COMPOUNDS; SILICON COMPOUNDS; SURFACE ROUGHNESS; THERMAL EXPANSION; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

AL-DOPED ZINC OXIDE; ELECTRICAL PROPERTIES AND MEASUREMENTS; RADIO-FREQUENCY MAGNETRON SPUTTERING; THICKNESS; TRANSMITTANCE;

SUBSTRATES;

EID: 62849109929     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.103     Document Type: Article

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