Optical and structural properties of ZnO thin films; effects of high energy electron irradiation and annealing

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 266, Issue 9, 2008, Pages 2021-2026

  Gür, Emre ^a   Asil, Hatice ^a   Coskun C ^a   Tuzemen S ^a   Meral, Kadem ^a   Onganer, Y ^a   Şerifoǧlu, Korkmaz ^b  

^a ATATÜRK UNIVERSITY   (Turkey)

^b ATATURK UNIVERSITY   (Turkey)

Author keywords

Annealing; Defect; Electron irradiation; PL; Recombination lifetime; XRD; ZnO

Indexed keywords

ANNEALING; ELECTRON IRRADIATION; FILM GROWTH; PHOTOLUMINESCENCE; X RAY DIFFRACTION; ZINC OXIDE;

CRYSTALLOGRAPHIC STRUCTURE; HIGH ENERGY ELECTRON IRRADIATION (HEEI); RECOMBINATION LIFETIME;

THIN FILMS;

EID: 43649100447     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2008.03.198     Document Type: Article

References (24)

1. Tüzemen S., Gür E., Yi{dotless}ldi{dotless}ri{dotless}m T., Xiong G., and Williams R.T. J. Appl. Phys. 100 10 (2006) 103513
2. Ohshima E., Ogino H., Niikura I., Maeda K., Sato M., Ito M., and Fukuda T. J. Cryst. Growth 260 (2004) 166
3. Makino T., Segawa Y., Kawasaki M., Ohtomo A., Shiroki R., Tamura K., Yasuda T., and Koinuma H. Appl. Phys. Lett. 78 (2001) 1237
4. Takagi T., Tanaka H., Fujita S., and Shigeo F. Jpn. J. Appl. Phys. 43 (2003) L401
5. Coskun C., Look D.C., Farlow G.C., and Sizelove J.R. Semicond. Sci. Technol. 19 (2004) 752
6. Claeys C., and Simoen E. Radiation Effects in Advanced Semicondcutor Materials and Devices (2002), Springer-Verlag, Berlin Heidelberg, Germany p. 2
7. Coşkun C., Gedik N., and Balci{dotless} E. Semicond. Sci. Technol. 21 (2006) 1656
8. Khanna R., et al. J. Electron. Mater. 24 4 (2005) 395
9. Auret F.D., Goodman S.A., Hayes M., Legodi M.J., van Laarhoven H.A., and Look D.C. Appl. Phys. Lett. 79 19 (2001) 3074
10. Oh D.C., Suzuki T., Kim J.J., Makino H., Hanada T., Cho M.W., and Yao T. Appl. Phys. Lett. 86 (2005) 032909
11. Tuomisto F., Saarinen K., and Look D.C. Phys. Stat. Sol. A 201 10 (2004) 2219
12. Weng J., Zhang Y., Han G., Zhang Y., Xu L., Xu J., Huang X., and Chen K. Thin Solid Films 478 (2005) 25
13. Joint Committee on Powder Diffraction Standards 1990 Set: 36 No: 1451 Swarthmore PA.
14. Karuppasamy A., and Subrahmanyam A. Mater. Lett. 61 (2007) 1256
15. Lin B., Fu Z., Jia Y., and Liao G. J. Electrochem. Soc. 148 3 (2001) G110
16. Jing Ma S., Kim Y., Sun Y., Wong G.K.L., and Ketterson J.B. Appl. Phys. Lett. 75 18 (1999) 2761
17. Wei X., Man B., Xue C., Chen C., and Liu M. Jpn. J. Appl. Phys. 45 11 (2006) 8586
18. Cao B., Cai W., and Zeng H. Appl. Phys. Lett. 88 (2006) 161101
19. Zang X.D., Liu C.L., Wang Z., Lü Y.Y., and Yin L.J. Nucl. Instr. and Meth. B 254 (2007) 83
20. Vanheusden K., Seager C.H., Warren W.L., Tallant D.R., and Voigt J.A. J. Appl. Phys. 68 3 (1996) 403
21. Wu X.L., Siu G.G., Fu C.L., and Ong H.C. Appl. Phys. Lett. 78 16 (2001) 2285
22. Look D.C., Hemsky J.W., and Sizelove J.R. Phys. Rev. Lett. 82 12 (1999) 2552
23. Özgür U., Teke A., Liu C., Cho S.-J., Morkoç H., and Everitt H.O. Appl. Phys. Lett. 84 12 (2004) 3223
24. Reynolds D.C., Look D.C., Jogai B., Hoelscher J.E., Sherriff R.E., Harris M.T., and Callahan M. J. Appl. Phys. 88 4 (2000) 2152