A quadruple-scanning-probe force microscope for electrical property measurements of microscopic materials

Nanotechnology

Volumn 22, Issue 28, 2011, Pages

  Higuchi, Seiji ^a,b,c   Kubo, Osamu ^a   Kuramochi, Hiromi ^a   Aono, Masakazu ^a   Nakayama, Tomonobu ^a,c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b HORIBA LTD   (Japan)

^c UNIVERSITY OF TSUKUBA   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; ELECTRICAL MEASUREMENT; ELECTRICAL PROPERTY MEASUREMENT; ELECTRODE FABRICATION; FORCE SENSOR; FOUR-PROBE; IN-SITU; INTRINSIC ELECTRICAL PROPERTY; LITHOGRAPHIC PROCESS; MICROSCOPIC FEATURES; MICROSCOPIC STRUCTURES; PROBE ELECTRODE; SILICON DIOXIDE FILM; SIMULTANEOUS IMAGING; TUNING FORKS; VAN DER PAUW METHOD;

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; GRAPHENE; PROBES; SILICA;

ELECTRIC VARIABLES MEASUREMENT;

EID: 79959189682     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/28/285205     Document Type: Article

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