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Thin Solid Films

Volumn 519, Issue 14, 2011, Pages 4447-4450

Effect of filament temperature and deposition time on the formation of tungsten silicide with silane

(2) Sveen, Chris E a Shi, Yujun a

a UNIVERSITY OF CALGARY (Canada)

Author keywords

Catalytic CVD; Diffusion; Evaporation; Filament aging; Hot wire CVD; Silane; Tungsten silicide

Indexed keywords

CATALYTIC CVD; CROSS-SECTIONAL SCANNING ELECTRON MICROSCOPIES; DEPOSITION TIME; FILAMENT TEMPERATURE; HIGHER TEMPERATURES; HOT WIRE CHEMICAL VAPOR DEPOSITION; HOT WIRE CVD; LOW TEMPERATURES; PARABOLIC RATE LAW; SILICIDE FORMATION; TUNGSTEN SILICIDE;

AUGER ELECTRON SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; EVAPORATION; PHASE INTERFACES; PHASE TRANSITIONS; SCANNING ELECTRON MICROSCOPY; SILICON; TUNGSTEN; WIRE;

SILICIDES;

EID: 79958865841 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2011.01.327 Document Type: Conference Paper

Times cited : (10)

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