Combinatorial approach to studying tungsten filament ageing in fabricating hydrogenated amorphous silicon using the hot-wire chemical vapour deposition technique

Measurement Science and Technology

Volumn 16, Issue 1, 2005, Pages 162-166

  Wang, Qi ^a  

^a NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

Author keywords

a Si:H; Combinatorial; Filament; HWCVD; Thin film

Indexed keywords

AGING OF MATERIALS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; ELECTRONIC PROPERTIES; HYDROGENATION; MORPHOLOGY; SUBSTRATES; THIN FILMS;

HOT-WIRE CHEMICAL VAPOR DEPOSITION (HWCVD); SAGGING; TUNGSTEN FILAMENT AGING;

TUNGSTEN;

AGING; CHEMICAL VAPOR DEPOSITION; SILICON; TUNGSTEN;

EID: 12344312385     PISSN: 09570233     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-0233/16/1/021     Document Type: Article

References (11)

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10. Matsumura H 2002 Private communication
11. Gallagher A C 2003 Private communication