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Volumn 187, Issue 2-3, 2004, Pages 146-153
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Growth kinetics of W5Si3 layer in WSi2/W system
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Author keywords
Diffusion and phase transformation; Growth kinetics; Tungsten; W silicides
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Indexed keywords
ARGON;
CHEMICAL VAPOR DEPOSITION;
DIFFUSION IN LIQUIDS;
GROWTH KINETICS;
INTERDIFFUSION (SOLIDS);
SCANNING ELECTRON MICROSCOPY;
X RAY DIFFRACTION ANALYSIS;
DIFFUSION CONTROLLED GROWTH;
DIFFUSION COUPLES;
INTERDIFFUSION COEFFICIENT;
PARABOLIC RATE LAW;
TUNGSTEN COMPOUNDS;
PHASE CHANGE;
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EID: 4644233995
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/j.surfcoat.2004.02.039 Document Type: Article |
Times cited : (50)
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References (18)
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