Hot Ta filament resistance in-situ monitoring under silane containing atmosphere

Thin Solid Films

Volumn 516, Issue 5, 2008, Pages 814-817

  Grunsky, D ^a   Schroeder, B ^b  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b France   (Germany)

Author keywords

a Si:H; Hot filament control; Hot wire deposition; Silicides

Indexed keywords

CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE; SILANES; SILICON; THIN FILMS;

HOT FILAMENT CONTROL; HOT WIRE DEPOSITION; TANTALUM SILICIDES; THICK SILICON DEPOSITS (TSD);

TANTALUM;

EID: 36849048848     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.06.143     Document Type: Article

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