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Volumn 62, Issue 1, 2011, Pages 195-201

Mobility analysis of surface roughness scattering in FinFET devices

Author keywords

Effective mobility; FinFET; Low temperature measurement; Surface roughness scattering; Surface separation

Indexed keywords

EFFECTIVE MOBILITIES; FINFET; LOW TEMPERATURE MEASUREMENT; SURFACE ROUGHNESS SCATTERING; SURFACE SEPARATION;

EID: 79957930553     PISSN: 00381101     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.sse.2011.04.020     Document Type: Article
Times cited : (47)

References (34)
  • 1
    • 79957956687 scopus 로고    scopus 로고
    • < http://www.itrs.net >
  • 13
    • 77957886518 scopus 로고    scopus 로고
    • Short-channel performance and mobility analysis of 〈1 1 0〉; -and 〈1 0 0〉-oriented tri-gate nanowire MOSFETs with raised source/drain extensions
    • Saitoh M, Nakabayashi Y, Itokawa H, Murano M, Mizushima I, Uchida K, et al. Short-channel performance and mobility analysis of 〈1 1 0〉; -and 〈1 0 0〉-oriented tri-gate nanowire MOSFETs with raised source/drain extensions. In: VLSI technology (VLSIT), symposium on; 2010. p. 169-70.
    • (2010) VLSI Technology (VLSIT), Symposium on , pp. 169-170
    • Saitoh, M.1    Nakabayashi, Y.2    Itokawa, H.3    Murano, M.4    Mizushima, I.5    Uchida, K.6


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.