Fin sidewall microroughness measurement by AFM

Materials Research Society Symposium Proceedings

Volumn 811, Issue , 2004, Pages 365-370

  Gondran, Carolyn F H ^a   Morales, Emily ^a   Guerry, Angela ^a   Xiong, Weize ^b   Cleavelin, C Rinn ^c   Wise, Rick ^c   Balasubramanian, Sriram ^d   King, Tsu Jae ^d  

^a SEMATECH   (United States)

^b X Chips Technologies Incorporated   (United States)

^c TEXAS INSTRUMENTS   (United States)

^d UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CARRIER MOBILITY; CHEMICAL ANALYSIS; DIELECTRIC MATERIALS; MOSFET DEVICES; OXIDATION; SURFACE ROUGHNESS;

MICROROUGHNESS; ROUGH SURFACES; SCALING LIMITS; SIDEWALL ROUGHNESS;

SILICON;

EID: 12744252876     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-811-e1.13     Document Type: Conference Paper

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