Electrical Transport characterization of nano CMOS devices with ultra-thin silicon film

Extended Abstracts of the 9th International Workshop on Junction Technology, IWJT 2009

Volumn , Issue , 2009, Pages 58-63

  Ghibaudo, G ^a   Mouis, M ^a   Pham Nguyen, L ^a,c   Bennamane, K ^a   Pappas, I ^a   Cros, A ^c   Bidal, G ^a,c   Fleury, D ^a,c   Claverie, A ^b   Benassayag, G ^b   Fazzini, P F ^b   Fenouillet Beranger, C ^c   Monfray, S ^c   Boeuf, F ^c   Cristoloveanu, S ^a   Skotnicki, T ^c   Collaert, N ^d  

^a IMEP LAHC   (France)

^b CEMES CNRS   (France)

^c STMICROELECTRONICS   (France)

^d IMEC   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 77950159041     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/IWJT.2009.5166220     Document Type: Conference Paper

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