Conductance histogram evolution of an EC-MCBJ fabricated Au atomic point contact

Nanotechnology

Volumn 22, Issue 27, 2011, Pages

  Yang, Yang ^a   Liu, Jun Yang ^a   Chen, Zhao Bin ^a   Tian, Jing Hua ^a   Jin, Xi ^a   Liu, Bo ^a   Li, Xiulan ^b   Luo, Zhong Zi ^a   Lu, Miao ^a   Yang, Fang Zu ^a   Tao, Nongjian ^b   Tian, Zhong Qun ^a  

^a XIAMEN UNIVERSITY   (China)

^b Arizona State University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDUCTANCE HISTOGRAMS; CONDUCTANCE QUANTIZATION; ELECTROCHEMICAL DEPOSITION; LAST STAGE; MECHANICALLY CONTROLLABLE BREAK JUNCTIONS; MICROFABRICATION PROCESS; PEAK HEIGHT;

ATOMS; GOLD COATINGS; GRAPHIC METHODS; MICROPROCESSOR CHIPS; REDUCTION; STATISTICAL METHODS; STRETCHING;

POINT CONTACTS;

EID: 79957830966     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/22/27/275313     Document Type: Article

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