Particle lithography with vapor deposition of organosilanes: A molecular toolkit for studying confined surface reactions in nanoscale liquid volumes

Thin Solid Films

Volumn 519, Issue 15, 2011, Pages 5223-5229

  Lusker, Kathie L ^a   Yu, Jing Jiang ^b   Garno, Jayne C ^a  

^a LOUISIANA STATE UNIVERSITY   (United States)

^b AGILENT TECHNOLOGIES   (United States)

Author keywords

Atomic force microscopy; Nanolithography; Nanopatterning; Nanostructures; Organosilane; Particle lithography; Self assembled monolayers; Vapor deposition

Indexed keywords

2D ARRAYS; ATOMIC FORCE; HIGH THROUGHPUT; HYDROLYSIS AND CONDENSATION; LATEX SPHERES; LIQUID VOLUME; MOLECULAR SELF ASSEMBLY; NANO PATTERN; NANO SCALE; NANOPATTERNING; NANOSCALE CONTROL; NUMBER DENSITY; ORGANOSILANES; PARTICLE LITHOGRAPHY; SPECIFIC LOCATION; SURFACE COVERAGES; TERMINAL GROUPS; WATER RESIDUES;

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; CONDENSATION REACTIONS; LITHOGRAPHY; NANOSTRUCTURED MATERIALS; NANOSTRUCTURES; SELF ASSEMBLED MONOLAYERS; SILANES; TWO DIMENSIONAL; WATER VAPOR;

SURFACE REACTIONS;

EID: 79957665809     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2011.01.164     Document Type: Conference Paper

References (73)

1. A.J. Haes, and R.P. Van Duyne J. Am. Chem. Soc. 124 2002 10596
2. A.D. Mcfarland, and R.P. Van Duyne Nano Lett. 3 2003 1057
3. K. Kempa, B. Kimball, J. Rybczynski, Z.P. Huang, P.F. Wu, D. Steeves, M. Sennett, M. Giersig, D.V.G.L.N. Rao, D.L. Carnahan, D.Z. Wang, J.Y. Lao, W.Z. Li, and Z.F. Ren Nano Lett. 3 2003 13
4. J. Han, and H.G. Craighead Science 288 2000 1026
5. K. Landskron, B.D. Hatton, D.D. Perovic, and G.A. Ozin Science 302 2003 266
6. J. Sagiv J. Am. Chem. Soc. 102 1980 92
7. L. Netzer, and J. Sagiv J. Am. Chem. Soc. 105 1983 674
8. J.-H. Kim, T.M. Cotton, and R.A. Uphaus J. Phys. Chem. 92 1988 5575
9. F. Schreiber Prog. Surf. Sci. 65 2000 151
10. D. Vuillaume, C. Boulas, J. Collet, G. Allan, and C. Delerue Phys. Rev. B 58 1998 16491
11. X. Xiao, J. Hu, D.H. Charych, M. Salmeron, Langmuir 1996 12 (1996) 235.
12. D.L. Angst, and G.W. Simmons Langmuir 7 1991 2236
13. A. Ulman Chem. Rev. 96 1996 1533
14. M. Woodson, and J. Liu Phys. Chem. Chem. Phys. 9 2007 207
15. K. Wen, R. Maoz, H. Cohen, J. Sagiv, A. Gibaud, A. Desert, and B.M. Ocko ACS Nano 2 2008 579
16. R. Maoz, and J. Sagiv J. Colloid Interface Sci. 100 1984 465
17. D.L. Allara, A.N. Parikh, and F. Rondelez Langmuir 11 1995 2357
18. A. Hozumi, Y. Yokogawa, and T. Kameyama J. Vac. Sci. Technol., A 19 2001 1812
19. J. Dong, A. Wang, K.Y.S. Ng, and G. Mao Thin Solid Films 515 2006 2116
20. M.E. McGovern, K.M.R. Kallury, and M. Thompson Langmuir 10 1994 3607
21. C.P. Tripp, and M.L. Hair Langmuir 11 1995 1215
22. J.B. Brzoska, N. Shahidzadeh, and F. Rondelez Nature 360 1992 719
23. A.N. Parikh, D.L. Allara, I.B. Azouz, and F. Rondelez J. Phys. Chem. 98 1994 7577
24. J. Foisner, A. Glaser, J. Kattner, H. Hoffmann, and G. Friedbacher Langmuir 19 2003 3741
25. N. Tillman, A. Ulman, J.S. Schildkraut, and T.L. Penner J. Am. Chem. Soc. 110 1988 6136
26. C.P. Tripp, and M.L. Hair Langmuir 8 1992 1120
27. P.M. St. John, and H.G. Craighead Appl. Phys. Lett. 68 1996 1022
28. D. Wang, S.G. Thomas, K.L. Wang, Y. Xia, and G.M. Whitesides Appl. Phys. Lett. 70 1997 1593
29. C.-Y. Xue, and K.-L. Yang J. Colloid Interface Sci. 344 2010 48
30. M.J. Lercei, G.F. Redinbo, F.D. Pardo, M. Rooks, R.C. Tiberio, P. Simpson, and H.G. Craighead J. Vac. Sci. Technol., B 12 1994 3663
31. M.J. Lercel, H.G. Craighead, A.N. Parikh, K. Seshadri, and D.L. Allara Appl. Phys. Lett. 68 1996 1504
32. H. Jung, R. Kulkarni, and C.P. Collier J. Am. Chem. Soc. 125 2003 12096
33. J. Gu, C.M. Yam, S. Li, and C. Cai J. Am. Chem. Soc. 126 2004 8098
34. J.E. Headrick, M. Armstrong, J. Cratty, S. Hammond, B.A. Sheriff, and C.L. Berrie Langmuir 21 2005 4117
35. S.p. Mornet, F.d.r. Brétagnol, Mannelli Ilaria, A. Valsesia, L. Sirghi, P. Colpo, and F. Rossi Small 4 2008 1919
36. N.J. Trujillo, S.H. Baxamusa, and K.K. Gleason Chem. Mater. 21 2009 742
37. Z. Sun, Y. Li, J. Zhang, Y. Li, Z. Zhao, K. Zhang, G. Zhang, J. Guo, and B. Yang Adv. Funct. Mater. 18 2008 4036
38. M.E. Abdelsalam, P.N. Bartlett, J.J. Baumberg, and S. Coyle Adv. Mater. 16 2004 90
39. W. Wang, Z. Dai, Y. Sun, and Y. Sun Thin Solid Films 517 2009 6050
40. C.M. Zhou, and D. Gall Thin Solid Films 516 2007 433
41. J.-R. Jeong, S. Kim, S.-H. Kim, J.A.C. Bland, S.-C. Shin, and S.-M. Yang Small 3 2007 1529
42. A. Kosiorek, W. Kandulski, H. Glaczynska, and M. Giersig Small 1 2005 439
43. X. Chen, Z. Chen, N. Fu, G. Lu, and B. Yang Adv. Mater. 15 2003 1413
44. C. Bae, H. Shin, J. Moon, and M.M. Sung Chem. Mater. 18 2006 1085
45. J.M. McLellan, M. Geissler, and Y. Xia J. Am. Chem. Soc. 126 2004 10830
46. J.-R. Li, G.C. Henry, and J.C. Garno Analyst 131 2006 244
47. J.C. Garno, N.A. Amro, K. Wadu-Mesthrige, and G.-Y. Liu Langmuir 18 2002 8186
48. Y. Cai, and B.M. Ocko Langmuir 21 2005 9274
49. F.A. Denis, P. Hanarp, D.S. Sutherland, J. Gold, C. Mustin, P.G. Rouxhet, and Y.F. Dufrene Langmuir 18 2002 819
50. H.W. Deckman, and J.H. Dunsmuir Appl. Phys. Lett. 41 1982 377
51. J.C. Hulteen, and R.P. Van Duyne J. Vac. Sci. Technol., A 13 1995 1553
52. A.L. Lipson, D.J. Comstock, and M.C. Hersam Small 5 2009 2807
53. J.X. Chen, W.S. Liao, X. Chen, T.L. Yang, S.E. Wark, D.H. Son, J.D. Batteas, and P.S. Cremer ACS Nano 3 2009 173
54. S.-M. Yang, S.G. Jang, D.-G. Choi, S. Kim, and H.K. Yu Small 2 2006 458
55. J.R. Li, and J.C. Garno Nano Lett. 8 2008 1916
56. J.R. Li, K.L. Lusker, J.J. Yu, and J.C. Garno ACS Nano 3 2009 2023
57. D. Nečas, P. Klapetek, http://gwyddion.net/, Brno, Czech Republic, 2009, p. A modular program for SPM (scanning probe microscopy) data visualization and analysis.
58. C.D. Wilcox, S.B. Dove, W.D. McDavid, D.B. Greer, http://ddsdx.uthscsa. edu/dig/itdesc.html, The University of Texas Health Science Center, San Antonio, Texas, 1992, p. UTHSCSA ImageTool v. 3.00.
59. T. Vallant, H. Brunner, U. Mayer, H. Hoffmann, T. Leitner, R. Resch, and G. Friedbacher J. Phys. Chem. B 102 1998 7190
60. N.L. Jeon, K. Finnie, K. Branshaw, and R.G. Nuzzo Langmuir 13 1997 3382
61. S.R. Wasserman, Y.-T. Tao, and G.M. Whitesides Langmuir 5 1989 1074
62. P.N. Thirtle, Z.X. Li, and R.K. Thomas Langmuir 13 1997 5451
63. A. Papra, N. Gadegaard, and N.B. Larsen Langmuir 17 2001 1457
64. P. Trens, and R. Denoyel Langmuir 12 1996 2781
65. A.V. Krasnoslobodtsev, and S.N. Smirnov Langmuir 18 2002 3181
66. E.T. Vandenberg, L. Bertilsson, B. Liedberg, K. Uvdal, R. Erlandsson, H. Elwing, and I. Lundstrom J. Colloid Interface Sci. 147 1991 103
67. G.A. Carson, and S. Granick J. Mater. Res. 5 1990 1745
68. R.R. Rye, G.C. Nelson, and M.T. Dugger Langmuir 13 1997 2965
69. C.L. Haynes, and R.P. Van Duyne J. Phys. Chem. B 105 2001 5599
70. M.L.K. Hoa, M. Lu, and Y. Zhang Adv. Colloid Interface Sci. 121 2006 9
71. E. Kim, Y. Xia, and G.M. Whitesides Adv. Mater. 8 1996 245
72. B. Gates, D. Qin, and Y. Xia Adv. Mater. 11 1999 466
73. P. Jiang, and M.J. McFarland J. Am. Chem. Soc. 126 2004 13778