The effect of annealing on filtered vacuum arc deposited ZnO thin films

Surface and Coatings Technology

Volumn 201, Issue 16-17, 2007, Pages 7266-7272

  Cetinorgu E ^a,b   Goldsmith, S ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

^b CUKUROVA UNIVERSITY   (Turkey)

Author keywords

Annealing; FVAD; Zinc oxide

Indexed keywords

ANNEALING; ELECTRIC CONDUCTIVITY; FUSED SILICA; LIGHT EXTINCTION; OPTICAL BAND GAPS; REFRACTIVE INDEX; THIN FILMS; VACUUM DEPOSITED COATINGS;

FILTERED VACUUM ARC DEPOSITION; ULTRAVIOLET FUSED SILICA; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

ZINC OXIDE;

ANNEALING; ELECTRIC CONDUCTIVITY; FUSED SILICA; LIGHT EXTINCTION; OPTICAL BAND GAPS; REFRACTIVE INDEX; THIN FILMS; VACUUM DEPOSITED COATINGS; ZINC OXIDE;

EID: 34047265017     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.01.036     Document Type: Article

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