Influence of radio frequency sputtering power towards the properties of indium zinc oxide semiconducting films

Scripta Materialia

Volumn 60, Issue 1, 2009, Pages 48-51

  Aw, K C ^a   Tsakadze, Z ^b   Lohani, A ^b   Mhaisalkar, S ^b  

^a UNIVERSITY OF AUCKLAND   (New Zealand)

^b NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Indium zinc oxide; IZO; R.f. magnetron sputtering

Indexed keywords

ELECTROMAGNETIC WAVES; INDIUM; OPTICAL PROPERTIES; OXIDE FILMS; RADIO; RADIO WAVES; SEMICONDUCTING INDIUM; ZINC; ZINC OXIDE;

ELECTRICAL AND OPTICAL PROPERTIES; INDIUM ZINC OXIDE; INDIUM ZINC OXIDES; IZO; R.F. MAGNETRON SPUTTERING; RADIO FREQUENCIES; RADIO-FREQUENCY SPUTTERING;

SEMICONDUCTING FILMS;

EID: 53949083063     PISSN: 13596462     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.scriptamat.2008.08.039     Document Type: Article

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