Nanocrystalline diamond growth in a surface-wave plasma

Diamond and Related Materials

Volumn 20, Issue 5-6, 2011, Pages 833-838

  Tsugawa, K ^a   Kawaki, S ^a   Ishihara, M ^a   Kim, J ^a   Koga, Y ^a   Sakakita, H ^a   Koguchi, H ^a   Hasegawa, M ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Low electron temperature; Microwave plasma CVD; Nanocrystalline diamond; Nucleation; Surface wave

Indexed keywords

DIAMOND GROWTH; ELECTRON DENSITIES; LOW ELECTRON TEMPERATURE; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; MICROWAVE PLASMA CVD; NANOCRYSTALLINE DIAMOND; NANOCRYSTALLINE DIAMOND FILMS; NANOCRYSTALLINE DIAMONDS; PLASMA DIAGNOSIS; SMOOTH SURFACE; SUBSTRATE TEMPERATURE; SURFACE WAVE PLASMA; SURFACE-WAVE EXCITED PLASMA;

CHEMICAL VAPOR DEPOSITION; DIAMOND FILMS; DIAMONDS; ELECTRON TEMPERATURE; ELECTRONS; MICROWAVES; NUCLEATION; PLASMA DEPOSITION; SURFACE WAVES;

PLASMAS;

EID: 79956077089     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2011.03.031     Document Type: Article

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