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Volumn 84, Issue 11, 2010, Pages 1347-1352
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Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition
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Author keywords
Grain size; Microwave plasma chemical vapor deposition; Surface smoothness; Ultra nanocrystalline diamond film
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Indexed keywords
10 MICRON;
AFM;
AR PLASMAS;
ARGON CONCENTRATION;
FILM DEPOSITION;
FORCE MICROSCOPY;
GRAIN SIZE;
MEDICAL IMPLANTS;
MICROELECTROMECHANICAL SYSTEMS;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION;
MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS;
NEGATIVE BIAS;
SEM;
SI (100) SUBSTRATE;
SURFACE ACOUSTIC WAVE DEVICE;
SURFACE SMOOTHNESS;
ULTRA-NANOCRYSTALLINE DIAMOND;
UV-RAMAN SPECTROSCOPY;
ACOUSTIC SURFACE WAVE DEVICES;
ACOUSTIC WAVES;
ACOUSTICS;
ARGON;
ATOMIC SPECTROSCOPY;
BIAS VOLTAGE;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
DIAMONDS;
DOSIMETRY;
GRAIN SIZE AND SHAPE;
MICROELECTROMECHANICAL DEVICES;
MICROWAVES;
PLASMA DEPOSITION;
PLASMAS;
RAMAN SPECTROSCOPY;
SCANNING ELECTRON MICROSCOPY;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
X RAY DIFFRACTION;
X RAY DIFFRACTION ANALYSIS;
DIAMOND FILMS;
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EID: 78049440854
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2010.03.002 Document Type: Article |
Times cited : (23)
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References (30)
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