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Volumn 84, Issue 11, 2010, Pages 1347-1352

Deposition and characterization of smooth ultra-nanocrystalline diamond film in CH4/H2/Ar by microwave plasma chemical vapor deposition

Author keywords

Grain size; Microwave plasma chemical vapor deposition; Surface smoothness; Ultra nanocrystalline diamond film

Indexed keywords

10 MICRON; AFM; AR PLASMAS; ARGON CONCENTRATION; FILM DEPOSITION; FORCE MICROSCOPY; GRAIN SIZE; MEDICAL IMPLANTS; MICROELECTROMECHANICAL SYSTEMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITIONS; NEGATIVE BIAS; SEM; SI (100) SUBSTRATE; SURFACE ACOUSTIC WAVE DEVICE; SURFACE SMOOTHNESS; ULTRA-NANOCRYSTALLINE DIAMOND; UV-RAMAN SPECTROSCOPY;

EID: 78049440854     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.03.002     Document Type: Article
Times cited : (23)

References (30)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.