Control of plasma space potentials and chemical vapor deposition of nanocrystalline diamond films in surface-wave excited low-pressure plasmas

Journal of Applied Physics

Volumn 101, Issue 2, 2007, Pages

  Kim, Jaeho ^a   Katsurai, Makoto ^a  

^a UNIVERSITY OF TOKYO   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; ELECTRON TEMPERATURE; PLASMA THEORY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SURFACE WAVES;

DIELECTRIC WINDOW; GROUNDED SUBSTRATES; PLASMA PARAMETERS;

DIAMOND FILMS;

EID: 33847743039     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2409761     Document Type: Article

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