Growth of nanocrystalline diamond films deposited by microwave plasma CVD system at low substrate temperatures

Physica Status Solidi (A) Applications and Materials Science

Volumn 203, Issue 12, 2006, Pages 3011-3015

  Potocky, S ^a   Kromka, A ^a,b   Potmesil, J ^a   Remes, Z ^a   Polackova, Z ^a   Vanecek, M ^a  

^a INSTITUTE OF MATHEMATICS   (Czech Republic)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROGEN ABSTRACTION MODEL; HYDROGEN-BASED GAS MIXTURE; NANOCRYSTALLINE DIAMOND (NCD) FILMS; ULTRASONIC BATH;

CRYSTAL STRUCTURE; NANOSTRUCTURED MATERIALS; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SEMICONDUCTOR GROWTH; SILICON;

DIAMOND FILMS;

EID: 33749414882     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200671110     Document Type: Conference Paper

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