Investigation of optical and compositional properties of thin SiN x:H films with an enhanced growth rate by high frequency PECVD method

Vacuum

Volumn 85, Issue 11, 2011, Pages 1032-1036

  Lee, Min Jung ^a   Kar, Joyti Prakash ^a   Lee, Tae Il ^a   Lee, Dongwon ^b   Choi, Dae Kyu ^b   Cho, Joong Hwee ^c   Myoung, Jae Min ^a  

^a Yonsei University   (South Korea)

^b New Power Plasma Co Ltd   (South Korea)

^c SolarLight Ltd   (South Korea)

Author keywords

Chemical vapor deposition; Gas flow ratio; Optical and compositional properties; SiNx:H

Indexed keywords

BAND TAIL; COMPOSITIONAL PROPERTIES; CONSTANT FLOW; ENHANCED GROWTH; GAS FLOW RATIO; HIGH FREQUENCY; PEAK ENERGY; SINX:H;

ABSORPTION SPECTROSCOPY; CHEMICAL VAPOR DEPOSITION; FLOW OF GASES; PHOTOELECTRON SPECTROSCOPY; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REFRACTIVE INDEX; SILICON NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 79955804747     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2011.03.012     Document Type: Article

References (22)

1. M.H. Jung, K.S. Kim, G.H. Park, and W.J. Cho Appl Phys Lett 94 2009 053508
2. E. Herth, B. Legrand, L. Buchaillot, N. Rolland, and T. Lasri Microelectronics Reliability 50 2010 1103
3. S. Chhajed, M.F. Schubert, J.K. Kim, and E.F. Schubert Appl Phys Lett 93 2008 251108
4. H.Y. Chang, C.Y. Meng, C.W. Huang, and S.C. Lee J Appl Phys 98 2005 501
5. H. Nagel, A.G. Aberle, and R. Hezel Prog Photovolt Res Appl 7 1997 245
6. B.S. Sahu, P. Srivastava, H.K. Sehgal, and O.P. Agnihotri Thin Solid Films 415 2002 53
7. G. Santana, J. Fandino, A. Ortiz, and J.C. Alonso J Non-Cryst Solids 351 2005 922
8. P. Doshi, G.E. Jellison, and A. Rohatgi Appl Opt 36 1997 7826
9. B.P. Swain, B.S. Swain, and N.M. Hwang Appl Surf Sci 255 2008 2557
10. C.W. Pearce, R.F. Fetcho, M.D. Gross, R.F. Koefer, and R.A. Pudlinear J Appl Phys 71 1992 1838
11. U.K. Das, S. Morrison, and A.J. Madan Non-Cryst Solids 299-302 2002 79
12. T. Takagi, K. Takechi, Y. Nakagawa, Y. Watabe, and S. Nishida Vacuum 51 1998 751
13. S. Kobayash, N. Ohrui, Y.C. Chao, T. Aoki, H. Kobayashi, and T. Asakawa J Mater Sci Mater Electron 18 2007 S29
14. K.S. Seol, T. Futami, T. Watanabe, Y. Ohki, and M. Takiyama J Appl Phys 85 1999 6746
15. A. Puzder, A.J. Williamson, J.C. Grossman, and G. Galli Phys Rev Lett 88 2002 097401
16. K. Maeda, and I. Umezu J Appl Phys 70 1991 2745
17. G. Allan, C. Delerue, and M. Lannoo Phys Rev Lett 76 1996 2961
18. J. Robertson, and M.J. Powell Appl Phys Lett 44 1984 415
19. F. Ay, and A. Aydinli Opt Mater 26 2004 33
20. S.S. Han, B.H. Jun, K. No, and B.S. Bae J Electrochem Soc 145 1998 652
21. J. Viard, E. Beche, D. Perarnau, R. Berjoan, and J. Durand J Europian Ceramic Soc 17 1997 2025
22. M.C. Poon, C.W. Kok, H. Wong, and P.J. Chan Thin Solid Films 462-463 2004 42