Investigation of local order of a-SiN:H films deposited by hot wire chemical vapour deposition (HWCVD)

Applied Surface Science

Volumn 255, Issue 5 PART 2, 2008, Pages 2557-2560

  Swain, Bibhu P ^a   Swain, Bhabani S ^a   Hwang, Nong M ^a  

^a Seoul National University   (South Korea)

Author keywords

a SiN:H; HWCVD; Raman; XPS

Indexed keywords

AMORPHOUS FILMS; AMORPHOUS MATERIALS; AMORPHOUS SILICON; CHEMICAL VAPOR DEPOSITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; NITROGEN; SILICON NITRIDE;

A-SIN:H; CHEMICAL VAPOUR DEPOSITION; ELECTRONIC ENVIRONMENTS; HWCVD; INTERMEDIATE RANGE ORDER; RAMAN; SHORT-RANGE ORDER; SILICON NETWORKS;

X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 56949098509     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2008.07.151     Document Type: Article

References (27)

1. Matsuki N., Abiko Y., Miyazaki K., Kobayashi M., Fujioka H., and Koinum H. Thin Solid Films 486 (2005) 210
2. Kessels W.M.M., Hong J., van Assche F.J.H., Moschner J.D., Lauinger T., Soppe W.J., Weeber A.W., Schram D.C., and van de Sanden M.C.M. J. Vac. Sci. Technol. B 20 (2002) 1704
3. Lustig N., and Kanki J. J. Appl. Phys. 65 (1989) 3951
4. Boonkosum W., Kruangam D., and Panyakeow S. J. Appl. Phys. 32 (1993) 1534
5. van Delden M.H.W.M., and van der We1 P.J. Proceedings of the IEEE 03CH37400 41st Annual International Reliability Physics Symposium. Dallas, TX (2003) 293
6. Gustavsson J., Altankov G., Errachid A., Samitier J., Planell J.A., and Engel E. Adv. Sci. Technol. 53 (2006) 122
7. Nelson B., Iwaniczko E., Mahan A., Wang Q., Xu Y., Crandall R., and Branz H. Thin Solid Films 395 (2001) 292
8. Verlaan V., Houweling S., Werf K.V.D., Goldbach H.D., and Schropp R.E.I. J. Appl. Phys. 46 (2007) 1290
9. Ledermann A., Weber U., Mukherji C., and Schroeder B. Thin Solid Films 395 (2001) 61
10. Mahan A.H., Carapella J., Nelson B.P., Crandall R.S., and Balberg I. J. Appl. Phys. 69 (1991) 6728
11. Honda N., Masuda A., and Matsumura H. J. Non-Cryst. Solids 266-269 (2000) 100
12. Matsumura H. J. Appl. Phys. 66 (1989) 3612
13. Waghmare P.C., Patil S.B., Kumbhar A.A., Rao R.G., and Dusane R.O. Thin Solid Films 430 (2003) 189
14. Masaki Y., Gibson R.A.G., and Lecomber P.G. J. Appl. Phys. 73 (1993) 5088
15. Stavola M., Jiang F., Rohatgi A., Kim D., Holt J., Holt H., Atwater H., and Kalejs J. Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion (2003) 909
16. Mahan A.H., Dhillon A.C., Gedvilas L.M., Williamson D.L., and Perkins J.D. J. Appl. Phys. 94 (2003) 2360
17. Dupont G., Caquineau H., Despax B., Bespan R., and Dollet A. J. Phys. D: Appl. Phys. 30 (1997) 1064
18. Schubert M.B., Mohring H.D., Lotter E., and Bauer G.H. IEEE Trans. Electron. Devices 36 (1989) 2863
19. Bustarret E., and Morgado E. Solid State Commun. 63 (1987) 581
20. Giorgis F., Pirri C.F., and Tresso E. Thin Solid Films 307 (1997) 298
21. Hayakawa R., Nakae M., Yoshimura T., Ashida A., and Fujimura N. J. Appl. Phys. 100 (2006) 73710
22. Bauer G.H., Hohring H.D., Bilger G., and Elcke A. J. Non-Cryst. Solids 77-78 (1985) 873
23. Chiang J.N., and Hess D.W. J. Appl. Phys 67 (1990) 6851
24. Swain B.P., and Dusane R.O. Mater. Chem. Phys. 99 (2006) 240
25. Beeman D., Tsu R., and Thrope M.F. Phys. Rev. B 32 (1985) 875
26. Giorgis F., Rava P., Galloni R., Rizzoli R., Summonte C., Crovini G., Demichelis F., Pirri C.F., Tresso E., and Rigato V. J. Non-Cryst. Solids 198-200 (1996) 596
27. Maley N., and Lanin J.S. Phys. Rev. B 36 (1987) 1146