Deposition of microcrystalline silicon solar cells via the pulsed PECVD technique

Journal of Non-Crystalline Solids

Volumn 299-302, Issue PART 1, 2002, Pages 79-82

  Das, Ujjwal K ^a   Morrison, Scott ^a   Madan, Arun ^a  

^a MVSystems Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL ORIENTATION; GRAIN BOUNDARIES; ION BOMBARDMENT; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SEMICONDUCTING SILICON; THIN FILMS;

MICROCRSYTALLINE-TO-AMORPHOUS TRANSITION;

SILICON SOLAR CELLS;

EID: 0036539084     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0022-3093(01)00945-0     Document Type: Conference Paper

References (6)