The low-temperature a-Si N x films with high impermeability and high optical gap with application to organic light-emitting diode

Journal of Applied Physics

Volumn 98, Issue 8, 2005, Pages

  Chang, Hsu Yu ^a   Meng, Chao Yu ^a   Huang, Ching Wei ^a   Lee, Si Chen ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION PEAKS; AMORPHOUS SILICON NITRIDE; OPTICAL GAP; ORGANIC LIGHT EMITTING DIODES;

AMORPHOUS SILICON; INFRARED SPECTROSCOPY; MECHANICAL PERMEABILITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON NITRIDE; THIN FILMS;

LIGHT EMITTING DIODES;

EID: 27744432430     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2089161     Document Type: Article

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