Role of incorporated hydrogen in non-stoichiometric photo-deposited silicon nitride films

Thin Solid Films

Volumn 415, Issue 1-2, 2002, Pages 53-56

  Sahu, B S ^a   Srivastava, P ^a   Sehgal, H K ^a   Agnihotri, O P ^a  

^a INDIAN INSTITUTE OF TECHNOLOGY DELHI   (India)

Author keywords

Deposition process; Fourier transform infrared spectroscopy (FTIR); Hydrogen; Silicon nitride

Indexed keywords

CARRIER CONCENTRATION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; IRRADIATION; SILICON NITRIDE; VAPOR DEPOSITION;

PHOTOCHEMICAL VAPOR DEPOSITION;

THIN FILMS;

EID: 0036671495     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00542-4     Document Type: Article

References (12)