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Volumn 140, Issue 3, 2001, Pages 206-214

Deposition of TiN thin films on Si(100) by HCD ion plating

Author keywords

HCD ion plating; Packing factor; Preferred orientation; Resistivity; TiN

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEPOSITION; ELECTRIC CONDUCTIVITY; FILMS; PLATING; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SUBSTRATES; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 0035978380     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01120-3     Document Type: Article
Times cited : (91)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.