Phase mixture in MOCVD and reactive sputtering TiOxNy thin films revealed and quantified by XPS factorial analysis

Acta Materialia

Volumn 54, Issue 11, 2006, Pages 3067-3074

  Guillot, Jérôme ^a   Chappé, Jean Marie ^b   Heintz, Olivier ^a   Martin, Nicolas ^b   Imhoff, Luc ^a   Takadoum, Jamal ^b  

^a LABORATOIRE INTERDISCIPLINAIRE CARNOT DE BOURGOGNE   (France)

^b Centre National de la Recherche Scientifique   (France)

Author keywords

Factorial analysis; Thin films; Titanium oxynitride; X ray photoelectron spectroscopy (XPS)

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; METALLOIDS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

FACTORIAL ANALYSIS; TITANIUM OXYNITRIDE; XPS FACTORIAL ANALYSIS;

TITANIUM OXIDES;

EID: 33747146755     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2006.02.042     Document Type: Article

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