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Volumn 600, Issue 18, 2006, Pages 3766-3769

Formation of Ti and TiN ultra-thin films on Si by ion beam sputter deposition

Author keywords

Sputter deposition; Titanium; Titanium nitride; X ray photoelectron spectroscopy (XPS)

Indexed keywords

ELECTRON EMISSION; ION BEAM ASSISTED DEPOSITION; RADIATION; SILICON; SPUTTER DEPOSITION; TITANIUM NITRIDE; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33748922073     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2006.01.080     Document Type: Article
Times cited : (4)

References (12)
  • 12
    • 0003459529 scopus 로고
    • Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Muilenberg G.E. (Eds), Perkin-Elmer Corporation, Eden Prairie, Minnesota
    • In: Wagner C.D., Riggs W.M., Davis L.E., Moulder J.F., and Muilenberg G.E. (Eds). Handbook of X-ray Photoelectron Spectroscopy (1979), Perkin-Elmer Corporation, Eden Prairie, Minnesota
    • (1979) Handbook of X-ray Photoelectron Spectroscopy


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.