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Volumn 83, Issue 10, 2009, Pages 1287-1290
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Control of the bias voltage in d.c. PVD processes on insulator substrates
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Author keywords
Adhesion; Color; Insulator substrates; Ion bombardment; Mechanical properties; PVD
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Indexed keywords
APPLIED BIAS;
CATHODIC ARC DEPOSITION;
CONDUCTIVE SUBSTRATES;
CONDUCTIVE SURFACES;
DC BIASING;
DEPOSITED FILMS;
ELECTRICAL CONDUCTIVITY;
FILMS PROPERTIES;
FLOATING POTENTIALS;
GROWTH OF THIN FILMS;
INSULATING SUBSTRATES;
INSULATOR SUBSTRATES;
METALLIC GRID;
NEGATIVE BIAS;
PVD;
SIMPLE METHOD;
SUBSTRATE BIAS;
SUBSTRATE BIAS VOLTAGES;
SUBSTRATE HOLDERS;
TIN COATING;
TIN FILMS;
ADHESION;
BIAS VOLTAGE;
COLOR;
COLOR FILMS;
CONDUCTIVE FILMS;
ELECTRIC CONDUCTIVITY;
GLASS CERAMICS;
GOLD DEPOSITS;
INSULATION;
ION BOMBARDMENT;
IONS;
MECHANICAL PROPERTIES;
PLASMAS;
TITANIUM COMPOUNDS;
TITANIUM NITRIDE;
SUBSTRATES;
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EID: 67349214933
PISSN: 0042207X
EISSN: None
Source Type: Journal
DOI: 10.1016/j.vacuum.2009.03.025 Document Type: Article |
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Times cited : (9)
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References (11)
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